Characterisation of Silicon Oxide films deposited by means of ECR PECVD

Alexeij Y. Kovalgin, I.G. Isai, J. Holleman, R. Dekker, P.H. Woerlee, Hans Wallinga

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

Keywords

@inproceedings{b905da0173234ac8bdbb8a659735617e,

title = "Characterisation of Silicon Oxide films deposited by means of ECR PECVD",

keywords = "METIS-113898",

author = "Kovalgin, \{Alexeij Y.\} and I.G. Isai and J. Holleman and R. Dekker and P.H. Woerlee and Hans Wallinga",

year = "1999",

month = nov,

day = "24",

language = "Undefined",

isbn = "90-73461-18-9",

pages = "239--246",

booktitle = "SAFE'99",

}