Characterisation of slow light in a waveguide grating

R.M. de Ridder, W.C.L. Hopman, Hugo Hoekstra

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    Abstract

    A grating was defined in a silicon nitride waveguide, using a combination of both conventional lithography and laser interference lithography. The structure was optically characterized in the 1520 – 1560 nm wavelength range by combining transmission measurements with the analysis of local out-of-plane scattered light, using a high-resolution infrared camera. From the measured power enhancement of the first Bloch-mode resonance above the long-wavelength band edge we estimated a Q > 10^4 and a group velocity of < 0.1 c.
    Original languageUndefined
    Title of host publicationProceedings of the eighth international conference on transparent optical networks, ICTON 2006
    EditorsM. Marciniak
    Place of PublicationPiscataway, NJ, USA
    PublisherIEEE
    Pages88-90
    Number of pages3
    ISBN (Print)1-4244-0235-2
    DOIs
    Publication statusPublished - Jun 2006
    Event8th International Conference on Transparent Optical Networks, ICTON 2006 - Nottingham, United Kingdom
    Duration: 18 Jun 200622 Jun 2006
    Conference number: 8

    Publication series

    Name
    PublisherInstitute of Electrical and Electronics Engineers
    Number2
    Volume2

    Conference

    Conference8th International Conference on Transparent Optical Networks, ICTON 2006
    Abbreviated titleICTON
    CountryUnited Kingdom
    CityNottingham
    Period18/06/0622/06/06

    Keywords

    • IOMS-SNS: SENSORS
    • IOMS-PCS: PHOTONIC CRYSTAL STRUCTURES
    • IR-65630
    • METIS-238033
    • EWI-2822

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