Characterisation of slow light in a waveguide grating

R.M. de Ridder, W.C.L. Hopman, Hugo Hoekstra

Abstract

A grating was defined in a silicon nitride waveguide, using a combination of both conventional lithography and laser interference lithography. The structure was optically characterized in the 1520 – 1560 nm wavelength range by combining transmission measurements with the analysis of local out-of-plane scattered light, using a high-resolution infrared camera. From the measured power enhancement of the first Bloch-mode resonance above the long-wavelength band edge we estimated a Q > 10^4 and a group velocity of < 0.1 c.
Original languageUndefined
Title of host publicationProceedings of the eighth international conference on transparent optical networks, ICTON 2006
EditorsM. Marciniak
Place of PublicationPiscataway, NJ, USA
PublisherInstitute of Electrical and Electronics Engineers
Pages88-90
Number of pages3
ISBN (Print)1-4244-0235-2
DOIs
StatePublished - Jun 2006
Event8th International Conference on Transparent Optical Networks, ICTON 2006 - Nottingham, United Kingdom

Publication series

Name
PublisherInstitute of Electrical and Electronics Engineers
Number2
Volume2

Conference

Conference8th International Conference on Transparent Optical Networks, ICTON 2006
Abbreviated titleICTON
CountryUnited Kingdom
CityNottingham
Period18/06/0622/06/06

Fingerprint

lithography
wavelengths
silicon nitrides
group velocity
cameras
gratings
waveguides
interference
augmentation
high resolution

Keywords

  • IOMS-SNS: SENSORS
  • IOMS-PCS: PHOTONIC CRYSTAL STRUCTURES
  • IR-65630
  • METIS-238033
  • EWI-2822

Cite this

de Ridder, R. M., Hopman, W. C. L., & Hoekstra, H. (2006). Characterisation of slow light in a waveguide grating. In M. Marciniak (Ed.), Proceedings of the eighth international conference on transparent optical networks, ICTON 2006 (pp. 88-90). Piscataway, NJ, USA: Institute of Electrical and Electronics Engineers. DOI: 10.1109/ICTON.2006.248344

de Ridder, R.M.; Hopman, W.C.L.; Hoekstra, Hugo / Characterisation of slow light in a waveguide grating.

Proceedings of the eighth international conference on transparent optical networks, ICTON 2006. ed. / M. Marciniak. Piscataway, NJ, USA : Institute of Electrical and Electronics Engineers, 2006. p. 88-90.

Research output: ScientificConference contribution

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de Ridder, RM, Hopman, WCL & Hoekstra, H 2006, Characterisation of slow light in a waveguide grating. in M Marciniak (ed.), Proceedings of the eighth international conference on transparent optical networks, ICTON 2006. Institute of Electrical and Electronics Engineers, Piscataway, NJ, USA, pp. 88-90, 8th International Conference on Transparent Optical Networks, ICTON 2006, Nottingham, United Kingdom, 18-22 June. DOI: 10.1109/ICTON.2006.248344

Characterisation of slow light in a waveguide grating. / de Ridder, R.M.; Hopman, W.C.L.; Hoekstra, Hugo.

Proceedings of the eighth international conference on transparent optical networks, ICTON 2006. ed. / M. Marciniak. Piscataway, NJ, USA : Institute of Electrical and Electronics Engineers, 2006. p. 88-90.

Research output: ScientificConference contribution

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T1 - Characterisation of slow light in a waveguide grating

AU - de Ridder,R.M.

AU - Hopman,W.C.L.

AU - Hoekstra,Hugo

PY - 2006/6

Y1 - 2006/6

N2 - A grating was defined in a silicon nitride waveguide, using a combination of both conventional lithography and laser interference lithography. The structure was optically characterized in the 1520 – 1560 nm wavelength range by combining transmission measurements with the analysis of local out-of-plane scattered light, using a high-resolution infrared camera. From the measured power enhancement of the first Bloch-mode resonance above the long-wavelength band edge we estimated a Q > 10^4 and a group velocity of < 0.1 c.

AB - A grating was defined in a silicon nitride waveguide, using a combination of both conventional lithography and laser interference lithography. The structure was optically characterized in the 1520 – 1560 nm wavelength range by combining transmission measurements with the analysis of local out-of-plane scattered light, using a high-resolution infrared camera. From the measured power enhancement of the first Bloch-mode resonance above the long-wavelength band edge we estimated a Q > 10^4 and a group velocity of < 0.1 c.

KW - IOMS-SNS: SENSORS

KW - IOMS-PCS: PHOTONIC CRYSTAL STRUCTURES

KW - IR-65630

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KW - EWI-2822

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BT - Proceedings of the eighth international conference on transparent optical networks, ICTON 2006

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de Ridder RM, Hopman WCL, Hoekstra H. Characterisation of slow light in a waveguide grating. In Marciniak M, editor, Proceedings of the eighth international conference on transparent optical networks, ICTON 2006. Piscataway, NJ, USA: Institute of Electrical and Electronics Engineers. 2006. p. 88-90. Available from, DOI: 10.1109/ICTON.2006.248344