Characterisation of slow light in a waveguide grating

R.M. de Ridder; W.C.L. Hopman; Hugo Hoekstra

doi:10.1109/ICTON.2006.248344

Characterisation of slow light in a waveguide grating

R.M. de Ridder
, W.C.L. Hopman
, Hugo Hoekstra

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic

260 Downloads (Pure)

Abstract

A grating was defined in a silicon nitride waveguide, using a combination of both conventional lithography and laser interference lithography. The structure was optically characterized in the 1520 – 1560 nm wavelength range by combining transmission measurements with the analysis of local out-of-plane scattered light, using a high-resolution infrared camera. From the measured power enhancement of the first Bloch-mode resonance above the long-wavelength band edge we estimated a Q > 10^4 and a group velocity of < 0.1 c.

Original language	Undefined
Title of host publication	Proceedings of the eighth international conference on transparent optical networks, ICTON 2006
Editors	M. Marciniak
Place of Publication	Piscataway, NJ, USA
Publisher	IEEE
Pages	88-90
Number of pages	3
ISBN (Print)	1-4244-0235-2
DOIs	https://doi.org/10.1109/ICTON.2006.248344
Publication status	Published - Jun 2006
Event	8th International Conference on Transparent Optical Networks, ICTON 2006 - Nottingham, United Kingdom Duration: 18 Jun 2006 → 22 Jun 2006 Conference number: 8

Publication series

Name
Publisher	Institute of Electrical and Electronics Engineers
Number	2
Volume	2

Conference

Conference	8th International Conference on Transparent Optical Networks, ICTON 2006
Abbreviated title	ICTON
Country/Territory	United Kingdom
City	Nottingham
Period	18/06/06 → 22/06/06

Keywords

IOMS-SNS: SENSORS
IOMS-PCS: PHOTONIC CRYSTAL STRUCTURES
IR-65630
METIS-238033
EWI-2822

Access to Document

10.1109/ICTON.2006.248344

Cite this

@inproceedings{01f6ec354f1a42538ff669e81cc5d95b,

title = "Characterisation of slow light in a waveguide grating",

abstract = "A grating was defined in a silicon nitride waveguide, using a combination of both conventional lithography and laser interference lithography. The structure was optically characterized in the 1520 – 1560 nm wavelength range by combining transmission measurements with the analysis of local out-of-plane scattered light, using a high-resolution infrared camera. From the measured power enhancement of the first Bloch-mode resonance above the long-wavelength band edge we estimated a Q > 10\textasciicircum{}4 and a group velocity of < 0.1 c.",

keywords = "IOMS-SNS: SENSORS, IOMS-PCS: PHOTONIC CRYSTAL STRUCTURES, IR-65630, METIS-238033, EWI-2822",

author = "\{de Ridder\}, R.M. and W.C.L. Hopman and Hugo Hoekstra",

year = "2006",

month = jun,

doi = "10.1109/ICTON.2006.248344",

language = "Undefined",

isbn = "1-4244-0235-2",

publisher = "IEEE",

number = "2",

pages = "88--90",

editor = "M. Marciniak",

booktitle = "Proceedings of the eighth international conference on transparent optical networks, ICTON 2006",

address = "United States",

note = "8th International Conference on Transparent Optical Networks, ICTON 2006 ; Conference date: 18-06-2006 Through 22-06-2006",

}

de Ridder, RM, Hopman, WCL & Hoekstra, H 2006, Characterisation of slow light in a waveguide grating. in M Marciniak (ed.), Proceedings of the eighth international conference on transparent optical networks, ICTON 2006. IEEE, Piscataway, NJ, USA, pp. 88-90, 8th International Conference on Transparent Optical Networks, ICTON 2006, Nottingham, United Kingdom, 18/06/06. https://doi.org/10.1109/ICTON.2006.248344

TY - GEN

T1 - Characterisation of slow light in a waveguide grating

AU - de Ridder, R.M.

AU - Hopman, W.C.L.

AU - Hoekstra, Hugo

N1 - Conference code: 8

PY - 2006/6

Y1 - 2006/6

N2 - A grating was defined in a silicon nitride waveguide, using a combination of both conventional lithography and laser interference lithography. The structure was optically characterized in the 1520 – 1560 nm wavelength range by combining transmission measurements with the analysis of local out-of-plane scattered light, using a high-resolution infrared camera. From the measured power enhancement of the first Bloch-mode resonance above the long-wavelength band edge we estimated a Q > 10^4 and a group velocity of < 0.1 c.

AB - A grating was defined in a silicon nitride waveguide, using a combination of both conventional lithography and laser interference lithography. The structure was optically characterized in the 1520 – 1560 nm wavelength range by combining transmission measurements with the analysis of local out-of-plane scattered light, using a high-resolution infrared camera. From the measured power enhancement of the first Bloch-mode resonance above the long-wavelength band edge we estimated a Q > 10^4 and a group velocity of < 0.1 c.

KW - IOMS-SNS: SENSORS

KW - IOMS-PCS: PHOTONIC CRYSTAL STRUCTURES

KW - IR-65630

KW - METIS-238033

KW - EWI-2822

U2 - 10.1109/ICTON.2006.248344

DO - 10.1109/ICTON.2006.248344

M3 - Conference contribution

SN - 1-4244-0235-2

SP - 88

EP - 90

BT - Proceedings of the eighth international conference on transparent optical networks, ICTON 2006

A2 - Marciniak, M.

PB - IEEE

CY - Piscataway, NJ, USA

T2 - 8th International Conference on Transparent Optical Networks, ICTON 2006

Y2 - 18 June 2006 through 22 June 2006

ER -