Characterization of Laminated CeO2-HfO2 High-K Gate Delectrics Deposited by Pulsed Laser Deposition

K. Karakaya, A. Zinine, J.G.M. van Berkum, P. Graat, M.A. Verheijen, Z.M. Rittersma, Augustinus J.H.M. Rijnders, David H.A. Blank

Research output: Contribution to conferencePoster

Original languageUndefined
Pages-
Publication statusPublished - 15 May 2005

Keywords

  • METIS-228657

Cite this

Karakaya, K., Zinine, A., van Berkum, J. G. M., Graat, P., Verheijen, M. A., Rittersma, Z. M., ... Blank, D. H. A. (2005). Characterization of Laminated CeO2-HfO2 High-K Gate Delectrics Deposited by Pulsed Laser Deposition. -.