Abstract
Mo/Si multilayer mirrors with nanoscale bilayer thicknesses have been deposited on stepped substrate topographies, using various deposition angles. The multilayer morphology at the step-edge region was studied by cross section transmission electron microscopy. A transition from a continuous- to columnar layer morphology is observed near the step-edge, as a function of the local angle of incidence of the deposition flux. Taking into account the corresponding kinetics and anisotropy in layer growth, a continuum model has been developed to give a detailed description of the height profiles of the individual continuous layers. Complementary optical characterization of the multilayer system using a microscope operating in the extreme ultraviolet wavelength range, revealed that the influence of the step-edge on the planar multilayer structure is restricted to a region within 300 nm from the step-edge.
| Original language | English |
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| Article number | 051803 |
| Pages (from-to) | 1-9 |
| Number of pages | 9 |
| Journal | Journal of vacuum science and technology. B: Microelectronics and nanometer structures |
| Volume | 29 |
| Issue number | 5 |
| DOIs | |
| Publication status | Published - 2011 |