Characterization of Plasma Polymerized Hexamethyldisiloxane Films Prepared by Arc Discharge

A. Lazauskas, Jonas Baltrusaitis, V. Grigaliunas, D Jucius, A. Guobiene, I. Prosycevas, P. Narmontas

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Herein, we present a simple method for fabricating plasma polymerized hexamethyldisiloxane films (pp-HMDSO) possessing superhydrophobic characteristics via arc discharge. The pp-HMDSO films were deposited on a soda–lime–silica float glass using HMDSO monomer vapor as a precursor. A detailed surface characterization was performed using scanning electron microscopy and atomic force microscopy. The growth process of the pp-HMDSO films was investigated as a function of deposition time from 30 to 300 s. The non-wetting characteristics of the pp-HMDSO films were evaluated by means of contact angle (CA) measurements and correlated with the morphological characteristics, as obtained from microscopy measurements. The deposited films were found to be nano-structured and exhibited dual-scale roughness with the static CA values close to 170°. Fourier transform infrared spectroscopy analysis was carried out to investigate chemical and functional properties of these films. Methyl groups were identified spectroscopically to be present within the pp-HMDSO films and were proposed to result in the low surface energy of material. The synergy between the dual-scale roughness and low surface energy resulted in the superhydrophobic characteristics of the pp-HMDSO films. A possible mechanism for the pp-HMDSO film formation is proposed
Original languageUndefined
Pages (from-to)271-285
JournalPlasma chemistry and plasma processing
Issue number2
Publication statusPublished - 2014


  • IR-93808
  • METIS-308382

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