Characterization of self-assembled monolayers on a ruthenium surface

Amrozia Shaheen; Jacobus Marinus Sturm; R. Ricciardi; Jurriaan  Huskens; Christopher James Lee; Frederik  Bijkerk

doi:10.1021/acs.langmuir.7b01068

Characterization of self-assembled monolayers on a ruthenium surface

Amrozia Shaheen, Jacobus Marinus Sturm, R. Ricciardi, Jurriaan Huskens, Christopher James Lee, Frederik Bijkerk

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Abstract

We have modified and stabilized the ruthenium surface by depositing a self-assembled monolayer (SAM) of 1-hexadecanethiol on a polycrystalline ruthenium thin film. The growth mechanism, dynamics, and stability of these monolayers were studied. SAMs, deposited under ambient conditions, on piranha-cleaned and piranha + H2SO4 cleaned substrates were compared to monolayers formed on H-radical-cleaned Ru surfaces. We found that alkanethiols on H-radical-cleaned Ru formed densely packed monolayers that remained stable when kept in a nitrogen atmosphere. X-ray photoelectron spectroscopy (XPS) shows a distinct sulfur peak (BE = 162.3 eV), corresponding to metal–sulfur bonding. When exposed to ambient conditions, the SAM decayed over a period of hours.

Original language	English
Pages (from-to)	6419-6429
Number of pages	8
Journal	Langmuir
Volume	33
Issue number	25
DOIs	https://doi.org/10.1021/acs.langmuir.7b01068
Publication status	Published - 6 Jun 2017

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Shaheen, A., Sturm, J. M., Ricciardi, R., Huskens, J., Lee, C. J., & Bijkerk, F. (2017). Characterization of self-assembled monolayers on a ruthenium surface. Langmuir, 33(25), 6419-6429. https://doi.org/10.1021/acs.langmuir.7b01068

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abstract = "We have modified and stabilized the ruthenium surface by depositing a self-assembled monolayer (SAM) of 1-hexadecanethiol on a polycrystalline ruthenium thin film. The growth mechanism, dynamics, and stability of these monolayers were studied. SAMs, deposited under ambient conditions, on piranha-cleaned and piranha + H2SO4 cleaned substrates were compared to monolayers formed on H-radical-cleaned Ru surfaces. We found that alkanethiols on H-radical-cleaned Ru formed densely packed monolayers that remained stable when kept in a nitrogen atmosphere. X-ray photoelectron spectroscopy (XPS) shows a distinct sulfur peak (BE = 162.3 eV), corresponding to metal–sulfur bonding. When exposed to ambient conditions, the SAM decayed over a period of hours.",

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T1 - Characterization of self-assembled monolayers on a ruthenium surface

AU - Shaheen, Amrozia

AU - Sturm, Jacobus Marinus

AU - Ricciardi, R.

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AU - Lee, Christopher James

AU - Bijkerk, Frederik

PY - 2017/6/6

Y1 - 2017/6/6

N2 - We have modified and stabilized the ruthenium surface by depositing a self-assembled monolayer (SAM) of 1-hexadecanethiol on a polycrystalline ruthenium thin film. The growth mechanism, dynamics, and stability of these monolayers were studied. SAMs, deposited under ambient conditions, on piranha-cleaned and piranha + H2SO4 cleaned substrates were compared to monolayers formed on H-radical-cleaned Ru surfaces. We found that alkanethiols on H-radical-cleaned Ru formed densely packed monolayers that remained stable when kept in a nitrogen atmosphere. X-ray photoelectron spectroscopy (XPS) shows a distinct sulfur peak (BE = 162.3 eV), corresponding to metal–sulfur bonding. When exposed to ambient conditions, the SAM decayed over a period of hours.

AB - We have modified and stabilized the ruthenium surface by depositing a self-assembled monolayer (SAM) of 1-hexadecanethiol on a polycrystalline ruthenium thin film. The growth mechanism, dynamics, and stability of these monolayers were studied. SAMs, deposited under ambient conditions, on piranha-cleaned and piranha + H2SO4 cleaned substrates were compared to monolayers formed on H-radical-cleaned Ru surfaces. We found that alkanethiols on H-radical-cleaned Ru formed densely packed monolayers that remained stable when kept in a nitrogen atmosphere. X-ray photoelectron spectroscopy (XPS) shows a distinct sulfur peak (BE = 162.3 eV), corresponding to metal–sulfur bonding. When exposed to ambient conditions, the SAM decayed over a period of hours.

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10.1021/acs.langmuir.7b01068Licence: CC BY-NC-ND

Langmuir 2017 ShaheenFinal published version, 3.88 MBLicence: CC BY-NC-ND

http://pubs.acs.org/doi/full/10.1021/acs.langmuir.7b01068