Characterization of self-assembled monolayers on a ruthenium surface

Amrozia Shaheen; Jacobus Marinus Sturm; R. Ricciardi; Jurriaan  Huskens; Christopher James Lee; Frederik  Bijkerk

doi:10.1021/acs.langmuir.7b01068

Characterization of self-assembled monolayers on a ruthenium surface

Amrozia Shaheen, Jacobus Marinus Sturm, R. Ricciardi, Jurriaan Huskens, Christopher James Lee, Frederik Bijkerk

Research output: Contribution to journal › Article › Academic › peer-review

8 Citations (Scopus)

65 Downloads (Pure)

Abstract

We have modified and stabilized the ruthenium surface by depositing a self-assembled monolayer (SAM) of 1-hexadecanethiol on a polycrystalline ruthenium thin film. The growth mechanism, dynamics, and stability of these monolayers were studied. SAMs, deposited under ambient conditions, on piranha-cleaned and piranha + H2SO4 cleaned substrates were compared to monolayers formed on H-radical-cleaned Ru surfaces. We found that alkanethiols on H-radical-cleaned Ru formed densely packed monolayers that remained stable when kept in a nitrogen atmosphere. X-ray photoelectron spectroscopy (XPS) shows a distinct sulfur peak (BE = 162.3 eV), corresponding to metal–sulfur bonding. When exposed to ambient conditions, the SAM decayed over a period of hours.

Original language	English
Pages (from-to)	6419-6429
Number of pages	8
Journal	Langmuir
Volume	33
Issue number	25
DOIs	https://doi.org/10.1021/acs.langmuir.7b01068
Publication status	Published - 6 Jun 2017

Access to Document

10.1021/acs.langmuir.7b01068Licence: CC BY-NC-ND

Langmuir 2017 ShaheenFinal published version, 3.88 MBLicence: CC BY-NC-ND

http://pubs.acs.org/doi/full/10.1021/acs.langmuir.7b01068

Fingerprint Dive into the research topics of 'Characterization of self-assembled monolayers on a ruthenium surface'. Together they form a unique fingerprint.

Cite this

@article{084b71dc373c432f84e10dd336dc706f,

title = "Characterization of self-assembled monolayers on a ruthenium surface",

abstract = "We have modified and stabilized the ruthenium surface by depositing a self-assembled monolayer (SAM) of 1-hexadecanethiol on a polycrystalline ruthenium thin film. The growth mechanism, dynamics, and stability of these monolayers were studied. SAMs, deposited under ambient conditions, on piranha-cleaned and piranha + H2SO4 cleaned substrates were compared to monolayers formed on H-radical-cleaned Ru surfaces. We found that alkanethiols on H-radical-cleaned Ru formed densely packed monolayers that remained stable when kept in a nitrogen atmosphere. X-ray photoelectron spectroscopy (XPS) shows a distinct sulfur peak (BE = 162.3 eV), corresponding to metal–sulfur bonding. When exposed to ambient conditions, the SAM decayed over a period of hours.",

author = "Amrozia Shaheen and Sturm, {Jacobus Marinus} and R. Ricciardi and Jurriaan Huskens and Lee, {Christopher James} and Frederik Bijkerk",

year = "2017",

month = jun,

day = "6",

doi = "10.1021/acs.langmuir.7b01068",

language = "English",

volume = "33",

pages = "6419--6429",

journal = "Langmuir",

issn = "0743-7463",

publisher = "American Chemical Society",

number = "25",

}

TY - JOUR

T1 - Characterization of self-assembled monolayers on a ruthenium surface

AU - Shaheen, Amrozia

AU - Sturm, Jacobus Marinus

AU - Ricciardi, R.

AU - Huskens, Jurriaan

AU - Lee, Christopher James

AU - Bijkerk, Frederik

PY - 2017/6/6

Y1 - 2017/6/6

N2 - We have modified and stabilized the ruthenium surface by depositing a self-assembled monolayer (SAM) of 1-hexadecanethiol on a polycrystalline ruthenium thin film. The growth mechanism, dynamics, and stability of these monolayers were studied. SAMs, deposited under ambient conditions, on piranha-cleaned and piranha + H2SO4 cleaned substrates were compared to monolayers formed on H-radical-cleaned Ru surfaces. We found that alkanethiols on H-radical-cleaned Ru formed densely packed monolayers that remained stable when kept in a nitrogen atmosphere. X-ray photoelectron spectroscopy (XPS) shows a distinct sulfur peak (BE = 162.3 eV), corresponding to metal–sulfur bonding. When exposed to ambient conditions, the SAM decayed over a period of hours.

AB - We have modified and stabilized the ruthenium surface by depositing a self-assembled monolayer (SAM) of 1-hexadecanethiol on a polycrystalline ruthenium thin film. The growth mechanism, dynamics, and stability of these monolayers were studied. SAMs, deposited under ambient conditions, on piranha-cleaned and piranha + H2SO4 cleaned substrates were compared to monolayers formed on H-radical-cleaned Ru surfaces. We found that alkanethiols on H-radical-cleaned Ru formed densely packed monolayers that remained stable when kept in a nitrogen atmosphere. X-ray photoelectron spectroscopy (XPS) shows a distinct sulfur peak (BE = 162.3 eV), corresponding to metal–sulfur bonding. When exposed to ambient conditions, the SAM decayed over a period of hours.

UR - http://pubs.acs.org/doi/full/10.1021/acs.langmuir.7b01068

U2 - 10.1021/acs.langmuir.7b01068

DO - 10.1021/acs.langmuir.7b01068

M3 - Article

VL - 33

SP - 6419

EP - 6429

JO - Langmuir

JF - Langmuir

SN - 0743-7463

IS - 25

ER -