The paper presents results of a study of slow light excitation and power enhancement on a waveguide with a grated section. The 500 periods grating was successfully fabricated by combining a conventional mask lithography step with laser interference lithography. The grating was characterized using both an end-fire and an infrared camera setup to measure respectively the transmission and to map and quantify the power scattered out of the grating. We report an estimated factor for the group velocity slowdown in a finite periodic structure of about 10 times, corresponding to a speed of 0.1c.
|Title of host publication||10th Annual Symposium IEEE/LEOS Benelux|
|Editors||P. Megret, M. Wuilpart, S. Bette, N. Staquet|
|Place of Publication||Mons, Belgium|
|Publisher||IEEE/LEOS Benelux Chapter|
|Number of pages||4|
|Publication status||Published - Dec 2005|
|Event||10th Annual Symposium of the IEEE/LEOS Benelux Chapter 2005 - Mons, Belgium|
Duration: 1 Dec 2008 → 2 Dec 2008
Conference number: 10
|Publisher||IEEE Lasers and Electro Optics Society|
|Conference||10th Annual Symposium of the IEEE/LEOS Benelux Chapter 2005|
|Period||1/12/08 → 2/12/08|
- IOMS-PCS: PHOTONIC CRYSTAL STRUCTURES
- IOMS-SNS: SENSORS
Hopman, W. C. L., Yudistira, D., Dekker, R., Engbers, W. F. A., Hoekstra, H., & de Ridder, R. M. (2005). Characterization of slow-light in a LIL-fabricated Si3N4 waveguide grating. In P. Megret, M. Wuilpart, S. Bette, & N. Staquet (Eds.), 10th Annual Symposium IEEE/LEOS Benelux (pp. 109-112). Mons, Belgium: IEEE/LEOS Benelux Chapter.