Characterization of slow-light in a LIL-fabricated Si3N4 waveguide grating

W.C.L. Hopman, D. Yudistira, R. Dekker, W.F.A. Engbers, Hugo Hoekstra, R.M. de Ridder

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    Abstract

    The paper presents results of a study of slow light excitation and power enhancement on a waveguide with a grated section. The 500 periods grating was successfully fabricated by combining a conventional mask lithography step with laser interference lithography. The grating was characterized using both an end-fire and an infrared camera setup to measure respectively the transmission and to map and quantify the power scattered out of the grating. We report an estimated factor for the group velocity slowdown in a finite periodic structure of about 10 times, corresponding to a speed of 0.1c.
    Original languageUndefined
    Title of host publication10th Annual Symposium IEEE/LEOS Benelux
    EditorsP. Megret, M. Wuilpart, S. Bette, N. Staquet
    Place of PublicationMons, Belgium
    PublisherIEEE/LEOS Benelux Chapter
    Pages109-112
    Number of pages4
    ISBN (Print)2-9600226-4-5
    Publication statusPublished - Dec 2005
    Event10th Annual Symposium of the IEEE/LEOS Benelux Chapter 2005 - Mons, Belgium
    Duration: 1 Dec 20082 Dec 2008
    Conference number: 10

    Publication series

    Name
    PublisherIEEE Lasers and Electro Optics Society

    Conference

    Conference10th Annual Symposium of the IEEE/LEOS Benelux Chapter 2005
    CountryBelgium
    CityMons
    Period1/12/082/12/08

    Keywords

    • EWI-1916
    • IOMS-PCS: PHOTONIC CRYSTAL STRUCTURES
    • METIS-228221
    • IR-58221
    • IOMS-SNS: SENSORS

    Cite this

    Hopman, W. C. L., Yudistira, D., Dekker, R., Engbers, W. F. A., Hoekstra, H., & de Ridder, R. M. (2005). Characterization of slow-light in a LIL-fabricated Si3N4 waveguide grating. In P. Megret, M. Wuilpart, S. Bette, & N. Staquet (Eds.), 10th Annual Symposium IEEE/LEOS Benelux (pp. 109-112). Mons, Belgium: IEEE/LEOS Benelux Chapter.