Characterization of slow-light in a LIL-fabricated Si3N4 waveguide grating

W.C.L. Hopman; D. Yudistira; R. Dekker; W.F.A. Engbers; Hugo Hoekstra; R.M. de Ridder

Characterization of slow-light in a LIL-fabricated Si₃N₄ waveguide grating

W.C.L. Hopman, D. Yudistira, R. Dekker, W.F.A. Engbers, Hugo Hoekstra, R.M. de Ridder

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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Abstract

The paper presents results of a study of slow light excitation and power enhancement on a waveguide with a grated section. The 500 periods grating was successfully fabricated by combining a conventional mask lithography step with laser interference lithography. The grating was characterized using both an end-fire and an infrared camera setup to measure respectively the transmission and to map and quantify the power scattered out of the grating. We report an estimated factor for the group velocity slowdown in a finite periodic structure of about 10 times, corresponding to a speed of 0.1c.

Original language	English
Title of host publication	10th Annual Symposium IEEE/LEOS Benelux
Editors	P. Megret, M. Wuilpart, S. Bette, N. Staquet
Place of Publication	Mons, Belgium
Publisher	IEEE
Pages	109-112
Number of pages	4
ISBN (Print)	2-9600226-4-5
Publication status	Published - Dec 2005
Event	10th Annual Symposium of the IEEE/LEOS Benelux Chapter 2005 - Mons, Belgium Duration: 1 Dec 2008 → 2 Dec 2008 Conference number: 10

Conference

Conference	10th Annual Symposium of the IEEE/LEOS Benelux Chapter 2005
Country/Territory	Belgium
City	Mons
Period	1/12/08 → 2/12/08

Keywords

IOMS-PCS: PHOTONIC CRYSTAL STRUCTURES
IOMS-SNS: SENSORS

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Cite this

@inproceedings{555883ba4d9e482e8d7e8079659b44ee,

title = "Characterization of slow-light in a LIL-fabricated Si3N4 waveguide grating",

abstract = "The paper presents results of a study of slow light excitation and power enhancement on a waveguide with a grated section. The 500 periods grating was successfully fabricated by combining a conventional mask lithography step with laser interference lithography. The grating was characterized using both an end-fire and an infrared camera setup to measure respectively the transmission and to map and quantify the power scattered out of the grating. We report an estimated factor for the group velocity slowdown in a finite periodic structure of about 10 times, corresponding to a speed of 0.1c.",

keywords = "IOMS-PCS: PHOTONIC CRYSTAL STRUCTURES, IOMS-SNS: SENSORS",

author = "W.C.L. Hopman and D. Yudistira and R. Dekker and W.F.A. Engbers and Hugo Hoekstra and \{de Ridder\}, R.M.",

year = "2005",

month = dec,

language = "English",

isbn = "2-9600226-4-5",

pages = "109--112",

editor = "P. Megret and M. Wuilpart and S. Bette and N. Staquet",

booktitle = "10th Annual Symposium IEEE/LEOS Benelux",

publisher = "IEEE",

address = "United States",

note = "10th Annual Symposium of the IEEE/LEOS Benelux Chapter 2005 ; Conference date: 01-12-2008 Through 02-12-2008",

}

Hopman, WCL, Yudistira, D, Dekker, R, Engbers, WFA, Hoekstra, H & de Ridder, RM 2005, Characterization of slow-light in a LIL-fabricated Si₃N₄ waveguide grating. in P Megret, M Wuilpart, S Bette & N Staquet (eds), 10th Annual Symposium IEEE/LEOS Benelux. IEEE, Mons, Belgium, pp. 109-112, 10th Annual Symposium of the IEEE/LEOS Benelux Chapter 2005, Mons, Belgium, 1/12/08.

Characterization of slow-light in a LIL-fabricated Si₃N₄ waveguide grating. / Hopman, W.C.L.; Yudistira, D.; Dekker, R. et al.
10th Annual Symposium IEEE/LEOS Benelux. ed. / P. Megret; M. Wuilpart; S. Bette; N. Staquet. Mons, Belgium: IEEE, 2005. p. 109-112.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Characterization of slow-light in a LIL-fabricated Si3N4 waveguide grating

AU - Hopman, W.C.L.

AU - Yudistira, D.

AU - Dekker, R.

AU - Engbers, W.F.A.

AU - Hoekstra, Hugo

AU - de Ridder, R.M.

N1 - Conference code: 10

PY - 2005/12

Y1 - 2005/12

N2 - The paper presents results of a study of slow light excitation and power enhancement on a waveguide with a grated section. The 500 periods grating was successfully fabricated by combining a conventional mask lithography step with laser interference lithography. The grating was characterized using both an end-fire and an infrared camera setup to measure respectively the transmission and to map and quantify the power scattered out of the grating. We report an estimated factor for the group velocity slowdown in a finite periodic structure of about 10 times, corresponding to a speed of 0.1c.

AB - The paper presents results of a study of slow light excitation and power enhancement on a waveguide with a grated section. The 500 periods grating was successfully fabricated by combining a conventional mask lithography step with laser interference lithography. The grating was characterized using both an end-fire and an infrared camera setup to measure respectively the transmission and to map and quantify the power scattered out of the grating. We report an estimated factor for the group velocity slowdown in a finite periodic structure of about 10 times, corresponding to a speed of 0.1c.

KW - IOMS-PCS: PHOTONIC CRYSTAL STRUCTURES

KW - IOMS-SNS: SENSORS

M3 - Conference contribution

SN - 2-9600226-4-5

SP - 109

EP - 112

BT - 10th Annual Symposium IEEE/LEOS Benelux

A2 - Megret, P.

A2 - Wuilpart, M.

A2 - Bette, S.

A2 - Staquet, N.

PB - IEEE

CY - Mons, Belgium

T2 - 10th Annual Symposium of the IEEE/LEOS Benelux Chapter 2005

Y2 - 1 December 2008 through 2 December 2008

ER -