Characterization of stress and texture in RTCVD poly-Si layers by X-ray diffraction

I. Barsony, J.G.E. Klappe, T.W. Ryan

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    Original languageUndefined
    Title of host publicationProceedings Symposium Materials Research Society, Vol. 239
    Place of PublicationBoston
    Pages177-182
    Number of pages0
    Publication statusPublished - 2 Dec 1992

    Keywords

    • METIS-114009

    Cite this

    Barsony, I., Klappe, J. G. E., & Ryan, T. W. (1992). Characterization of stress and texture in RTCVD poly-Si layers by X-ray diffraction. In Proceedings Symposium Materials Research Society, Vol. 239 (pp. 177-182). Boston.