@inproceedings{ad6c7964ecbe4b44a244353b8ae440dd,
title = "Characterization of Ta-based barrier Films on SiLK for Cu-metalization",
keywords = "METIS-207521",
author = "{van Nieuwkasteele-Bystrova}, {Svetlana Nikolajevna} and Wolters, {Robertus A.M.} and J. Holleman and P.H. Woerlee",
year = "2002",
month = nov,
day = "27",
language = "Undefined",
isbn = "90-73461-33-2",
pages = "1--5",
booktitle = "Proceedings of 5th Annual Workshop on Semiconductors Advances for Future Electronics SAFE 2002",
publisher = "STW",
}