Characterization of Ta-based barrier Films on SiLK for Cu-metalization

Svetlana Nikolajevna van Nieuwkasteele-Bystrova, Robertus A.M. Wolters, J. Holleman, P.H. Woerlee

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

Original language	Undefined
Title of host publication	Proceedings of 5th Annual Workshop on Semiconductors Advances for Future Electronics SAFE 2002
Place of Publication	Utrecht, The Netherlands
Publisher	STW
Pages	1-5
Number of pages	5
ISBN (Print)	90-73461-33-2
Publication status	Published - 27 Nov 2002

Keywords

@inproceedings{ad6c7964ecbe4b44a244353b8ae440dd,

title = "Characterization of Ta-based barrier Films on SiLK for Cu-metalization",

keywords = "METIS-207521",

author = "{van Nieuwkasteele-Bystrova}, {Svetlana Nikolajevna} and Wolters, {Robertus A.M.} and J. Holleman and P.H. Woerlee",

year = "2002",

month = nov,

day = "27",

language = "Undefined",

isbn = "90-73461-33-2",

pages = "1--5",

booktitle = "Proceedings of 5th Annual Workshop on Semiconductors Advances for Future Electronics SAFE 2002",

publisher = "STW",

}

Proceedings of 5th Annual Workshop on Semiconductors Advances for Future Electronics SAFE 2002. Utrecht, The Netherlands : STW, 2002. p. 1-5.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Characterization of Ta-based barrier Films on SiLK for Cu-metalization

AU - van Nieuwkasteele-Bystrova, Svetlana Nikolajevna

AU - Wolters, Robertus A.M.

AU - Holleman, J.

AU - Woerlee, P.H.

PY - 2002/11/27

Y1 - 2002/11/27

KW - METIS-207521

M3 - Conference contribution

SN - 90-73461-33-2

SP - 1

EP - 5

BT - Proceedings of 5th Annual Workshop on Semiconductors Advances for Future Electronics SAFE 2002

PB - STW

CY - Utrecht, The Netherlands

ER -