Characterization of Ta-based barrier Films on SiLK for Cu-metalization

Svetlana Nikolajevna van Nieuwkasteele-Bystrova, Robertus A.M. Wolters, J. Holleman, P.H. Woerlee

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    Original languageUndefined
    Title of host publicationProceedings of 5th Annual Workshop on Semiconductors Advances for Future Electronics SAFE 2002
    Place of PublicationUtrecht, The Netherlands
    PublisherSTW
    Pages1-5
    Number of pages5
    ISBN (Print)90-73461-33-2
    Publication statusPublished - 27 Nov 2002

    Keywords

    • METIS-207521

    Cite this