Characterization of thin alumina films prepared by metal-organic chemical vapour deposition (MOCVD) by high-resolution SEM, (AR)XPS and AES depth profiling

W.F. Lisowski, A.H.J. van den Berg, M.A. Smithers, V.A.C. Haanappel

Research output: Contribution to journalArticleAcademicpeer-review

8 Citations (Scopus)
Original languageUndefined
Pages (from-to)707-712
Number of pages6
JournalFresenius journal of analytical chemistry
Issue number353
Publication statusPublished - 1995


  • METIS-128923

Cite this