| Original language | Undefined |
|---|---|
| Pages (from-to) | 707-712 |
| Number of pages | 6 |
| Journal | Fresenius journal of analytical chemistry |
| Issue number | 353 |
| Publication status | Published - 1995 |
Keywords
- METIS-128923
Cite this
Lisowski, W. F., van den Berg, A. H. J., Smithers, M. A., & Haanappel, V. A. C. (1995). Characterization of thin alumina films prepared by metal-organic chemical vapour deposition (MOCVD) by high-resolution SEM, (AR)XPS and AES depth profiling. Fresenius journal of analytical chemistry, (353), 707-712.