| Original language | Undefined |
|---|---|
| Pages (from-to) | 707-712 |
| Number of pages | 6 |
| Journal | Fresenius journal of analytical chemistry |
| Issue number | 353 |
| Publication status | Published - 1995 |
Keywords
- METIS-128923
Cite this
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Characterization of thin alumina films prepared by metal-organic chemical vapour deposition (MOCVD) by high-resolution SEM, (AR)XPS and AES depth profiling. / Lisowski, W.F.; van den Berg, A.H.J.; Smithers, M.A.; Haanappel, V.A.C.
In: Fresenius journal of analytical chemistry, No. 353, 1995, p. 707-712.Research output: Contribution to journal › Article › Academic › peer-review
TY - JOUR
T1 - Characterization of thin alumina films prepared by metal-organic chemical vapour deposition (MOCVD) by high-resolution SEM, (AR)XPS and AES depth profiling
AU - Lisowski, W.F.
AU - van den Berg, A.H.J.
AU - Smithers, M.A.
AU - Haanappel, V.A.C.
PY - 1995
Y1 - 1995
KW - METIS-128923
M3 - Article
SP - 707
EP - 712
JO - Fresenius journal of analytical chemistry
JF - Fresenius journal of analytical chemistry
SN - 0937-0633
IS - 353
ER -