Characterization of thin alumina films prepared by metal-organic chemical vapour deposition (MOCVD) by high-resolution SEM, (AR)XPS and AES depth profiling

W.F. Lisowski, A.H.J. van den Berg, M.A. Smithers, V.A.C. Haanappel

Research output: Contribution to journalArticleAcademicpeer-review

6 Citations (Scopus)
Original languageUndefined
Pages (from-to)707-712
Number of pages6
JournalFresenius journal of analytical chemistry
Issue number353
Publication statusPublished - 1995

Keywords

  • METIS-128923

Cite this

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title = "Characterization of thin alumina films prepared by metal-organic chemical vapour deposition (MOCVD) by high-resolution SEM, (AR)XPS and AES depth profiling",
keywords = "METIS-128923",
author = "W.F. Lisowski and {van den Berg}, A.H.J. and M.A. Smithers and V.A.C. Haanappel",
year = "1995",
language = "Undefined",
pages = "707--712",
journal = "Fresenius journal of analytical chemistry",
issn = "0937-0633",
publisher = "Springer",
number = "353",

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Characterization of thin alumina films prepared by metal-organic chemical vapour deposition (MOCVD) by high-resolution SEM, (AR)XPS and AES depth profiling. / Lisowski, W.F.; van den Berg, A.H.J.; Smithers, M.A.; Haanappel, V.A.C.

In: Fresenius journal of analytical chemistry, No. 353, 1995, p. 707-712.

Research output: Contribution to journalArticleAcademicpeer-review

TY - JOUR

T1 - Characterization of thin alumina films prepared by metal-organic chemical vapour deposition (MOCVD) by high-resolution SEM, (AR)XPS and AES depth profiling

AU - Lisowski, W.F.

AU - van den Berg, A.H.J.

AU - Smithers, M.A.

AU - Haanappel, V.A.C.

PY - 1995

Y1 - 1995

KW - METIS-128923

M3 - Article

SP - 707

EP - 712

JO - Fresenius journal of analytical chemistry

JF - Fresenius journal of analytical chemistry

SN - 0937-0633

IS - 353

ER -