| Original language | Undefined |
|---|---|
| Pages (from-to) | 707-712 |
| Number of pages | 6 |
| Journal | Fresenius journal of analytical chemistry |
| Issue number | 353 |
| Publication status | Published - 1995 |
Keywords
- METIS-128923
Characterization of thin alumina films prepared by metal-organic chemical vapour deposition (MOCVD) by high-resolution SEM, (AR)XPS and AES depth profiling
W.F. Lisowski, A.H.J. van den Berg, M.A. Smithers, V.A.C. Haanappel
Research output: Contribution to journal › Article › Academic › peer-review
8
Citations
(Scopus)