Characterization of tungsten tips for STM by SEM/AES/XPS

W. Lisowski; A.H.J. van den Berg; G.A.M. Kip; L.J. Hanekamp

doi:10.1007/BF00321548

Characterization of tungsten tips for STM by SEM/AES/XPS

W. Lisowski, A.H.J. van den Berg, G.A.M. Kip, L.J. Hanekamp

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Abstract

For the first time, both X-ray Photoelectron Spectroscopy (XPS) and Auger Electron Spectroscopy (AES) techniques were applied in analysis of surface contamination of electrochemically etched Scanning Tunneling Microscope (STM) tungsten tips. Carbon monoxide, graphite, tungsten carbide and tungsten oxide were found as main surface contaminations of STM tungsten tips. The thickness of tungsten oxide layers was estimated to be about 1–3 nm. Quantitative analysis of surface and bulk concentration of carbon, oxygen and tungsten has been performed.

Original language	English
Pages (from-to)	196-199
Number of pages	4
Journal	Fresenius journal of analytical chemistry
Volume	341
Issue number	3-4
DOIs	https://doi.org/10.1007/BF00321548
Publication status	Published - 1991

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title = "Characterization of tungsten tips for STM by SEM/AES/XPS",

abstract = "For the first time, both X-ray Photoelectron Spectroscopy (XPS) and Auger Electron Spectroscopy (AES) techniques were applied in analysis of surface contamination of electrochemically etched Scanning Tunneling Microscope (STM) tungsten tips. Carbon monoxide, graphite, tungsten carbide and tungsten oxide were found as main surface contaminations of STM tungsten tips. The thickness of tungsten oxide layers was estimated to be about 1–3 nm. Quantitative analysis of surface and bulk concentration of carbon, oxygen and tungsten has been performed.",

author = "W. Lisowski and {van den Berg}, A.H.J. and G.A.M. Kip and L.J. Hanekamp",

year = "1991",

doi = "10.1007/BF00321548",

language = "English",

volume = "341",

pages = "196--199",

journal = "Fresenius journal of analytical chemistry",

issn = "0937-0633",

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T1 - Characterization of tungsten tips for STM by SEM/AES/XPS

AU - Lisowski, W.

AU - van den Berg, A.H.J.

AU - Kip, G.A.M.

AU - Hanekamp, L.J.

PY - 1991

Y1 - 1991

N2 - For the first time, both X-ray Photoelectron Spectroscopy (XPS) and Auger Electron Spectroscopy (AES) techniques were applied in analysis of surface contamination of electrochemically etched Scanning Tunneling Microscope (STM) tungsten tips. Carbon monoxide, graphite, tungsten carbide and tungsten oxide were found as main surface contaminations of STM tungsten tips. The thickness of tungsten oxide layers was estimated to be about 1–3 nm. Quantitative analysis of surface and bulk concentration of carbon, oxygen and tungsten has been performed.

AB - For the first time, both X-ray Photoelectron Spectroscopy (XPS) and Auger Electron Spectroscopy (AES) techniques were applied in analysis of surface contamination of electrochemically etched Scanning Tunneling Microscope (STM) tungsten tips. Carbon monoxide, graphite, tungsten carbide and tungsten oxide were found as main surface contaminations of STM tungsten tips. The thickness of tungsten oxide layers was estimated to be about 1–3 nm. Quantitative analysis of surface and bulk concentration of carbon, oxygen and tungsten has been performed.

U2 - 10.1007/BF00321548

DO - 10.1007/BF00321548

M3 - Article

SN - 0937-0633

VL - 341

SP - 196

EP - 199

JO - Fresenius journal of analytical chemistry

JF - Fresenius journal of analytical chemistry

IS - 3-4

ER -

Characterization of tungsten tips for STM by SEM/AES/XPS

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