Charge carrier transport and electroluminescence in atomic layer deposited poly-GaN/c-Si heterojunction diodes

Gaurav Gupta* (Corresponding Author), Sourish Banerjee, Satadal Dutta, Antonius A.I. Aarnink, Jurriaan Schmitz, Alexey Y. Kovalgin, Raymond J.E. Hueting

*Corresponding author for this work

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    Abstract

    In this work, we study the charge carrier transport and electroluminescence (EL) in thin-film polycrystalline (poly-) GaN/c-Si heterojunction diodes realized using a plasma enhanced atomic layer deposition process. The fabricated poly-GaN/p-Si diode with a native oxide at the interface showed a rectifying behavior (Ion/Ioff ratio ∼ 103 at ±3 V) with current-voltage characteristics reaching an ideality factor n of ∼5.17. The areal (Ja) and peripheral (Jp) components of the current density were extracted, and their temperature dependencies were studied. The space charge limited current (SCLC) in the presence of traps is identified as the dominant carrier transport mechanism for Ja in forward bias. An effective trap density of 4.6 × 1017/cm3 at a trap energy level of 0.13 eV below the GaN conduction band minimum was estimated by analyzing Ja. Other basic electrical properties of the material such as the free carrier concentration, effective density of states in the conduction band, electron mobility, and dielectric relaxation time were also determined from the current-voltage analysis in the SCLC regime. Further, infrared EL corresponding to the Si bandgap was observed from the fabricated diodes. The observed EL intensity from the GaN/p-Si heterojunction diode is ∼3 orders of magnitude higher as compared to the conventional Si only counterpart. The enhanced infrared light emission is attributed to the improved injector efficiency of the GaN/Si diode because of the wide bandgap of the poly-GaN layer and the resulting band discontinuity at the GaN/Si interface.

    Original languageEnglish
    Article number084503
    Number of pages8
    JournalJournal of applied physics
    Volume124
    Issue number8
    DOIs
    Publication statusPublished - 28 Aug 2018

    Fingerprint

    electroluminescence
    heterojunctions
    charge carriers
    diodes
    traps
    space charge
    conduction bands
    electric potential
    atomic layer epitaxy
    injectors
    electron mobility
    light emission
    discontinuity
    relaxation time
    energy levels
    electrical properties
    current density
    oxides
    thin films
    ions

    Cite this

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    title = "Charge carrier transport and electroluminescence in atomic layer deposited poly-GaN/c-Si heterojunction diodes",
    abstract = "In this work, we study the charge carrier transport and electroluminescence (EL) in thin-film polycrystalline (poly-) GaN/c-Si heterojunction diodes realized using a plasma enhanced atomic layer deposition process. The fabricated poly-GaN/p-Si diode with a native oxide at the interface showed a rectifying behavior (Ion/Ioff ratio ∼ 103 at ±3 V) with current-voltage characteristics reaching an ideality factor n of ∼5.17. The areal (Ja) and peripheral (Jp) components of the current density were extracted, and their temperature dependencies were studied. The space charge limited current (SCLC) in the presence of traps is identified as the dominant carrier transport mechanism for Ja in forward bias. An effective trap density of 4.6 × 1017/cm3 at a trap energy level of 0.13 eV below the GaN conduction band minimum was estimated by analyzing Ja. Other basic electrical properties of the material such as the free carrier concentration, effective density of states in the conduction band, electron mobility, and dielectric relaxation time were also determined from the current-voltage analysis in the SCLC regime. Further, infrared EL corresponding to the Si bandgap was observed from the fabricated diodes. The observed EL intensity from the GaN/p-Si heterojunction diode is ∼3 orders of magnitude higher as compared to the conventional Si only counterpart. The enhanced infrared light emission is attributed to the improved injector efficiency of the GaN/Si diode because of the wide bandgap of the poly-GaN layer and the resulting band discontinuity at the GaN/Si interface.",
    author = "Gaurav Gupta and Sourish Banerjee and Satadal Dutta and Aarnink, {Antonius A.I.} and Jurriaan Schmitz and Kovalgin, {Alexey Y.} and Hueting, {Raymond J.E.}",
    year = "2018",
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    day = "28",
    doi = "10.1063/1.5041089",
    language = "English",
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    TY - JOUR

    T1 - Charge carrier transport and electroluminescence in atomic layer deposited poly-GaN/c-Si heterojunction diodes

    AU - Gupta, Gaurav

    AU - Banerjee, Sourish

    AU - Dutta, Satadal

    AU - Aarnink, Antonius A.I.

    AU - Schmitz, Jurriaan

    AU - Kovalgin, Alexey Y.

    AU - Hueting, Raymond J.E.

    PY - 2018/8/28

    Y1 - 2018/8/28

    N2 - In this work, we study the charge carrier transport and electroluminescence (EL) in thin-film polycrystalline (poly-) GaN/c-Si heterojunction diodes realized using a plasma enhanced atomic layer deposition process. The fabricated poly-GaN/p-Si diode with a native oxide at the interface showed a rectifying behavior (Ion/Ioff ratio ∼ 103 at ±3 V) with current-voltage characteristics reaching an ideality factor n of ∼5.17. The areal (Ja) and peripheral (Jp) components of the current density were extracted, and their temperature dependencies were studied. The space charge limited current (SCLC) in the presence of traps is identified as the dominant carrier transport mechanism for Ja in forward bias. An effective trap density of 4.6 × 1017/cm3 at a trap energy level of 0.13 eV below the GaN conduction band minimum was estimated by analyzing Ja. Other basic electrical properties of the material such as the free carrier concentration, effective density of states in the conduction band, electron mobility, and dielectric relaxation time were also determined from the current-voltage analysis in the SCLC regime. Further, infrared EL corresponding to the Si bandgap was observed from the fabricated diodes. The observed EL intensity from the GaN/p-Si heterojunction diode is ∼3 orders of magnitude higher as compared to the conventional Si only counterpart. The enhanced infrared light emission is attributed to the improved injector efficiency of the GaN/Si diode because of the wide bandgap of the poly-GaN layer and the resulting band discontinuity at the GaN/Si interface.

    AB - In this work, we study the charge carrier transport and electroluminescence (EL) in thin-film polycrystalline (poly-) GaN/c-Si heterojunction diodes realized using a plasma enhanced atomic layer deposition process. The fabricated poly-GaN/p-Si diode with a native oxide at the interface showed a rectifying behavior (Ion/Ioff ratio ∼ 103 at ±3 V) with current-voltage characteristics reaching an ideality factor n of ∼5.17. The areal (Ja) and peripheral (Jp) components of the current density were extracted, and their temperature dependencies were studied. The space charge limited current (SCLC) in the presence of traps is identified as the dominant carrier transport mechanism for Ja in forward bias. An effective trap density of 4.6 × 1017/cm3 at a trap energy level of 0.13 eV below the GaN conduction band minimum was estimated by analyzing Ja. Other basic electrical properties of the material such as the free carrier concentration, effective density of states in the conduction band, electron mobility, and dielectric relaxation time were also determined from the current-voltage analysis in the SCLC regime. Further, infrared EL corresponding to the Si bandgap was observed from the fabricated diodes. The observed EL intensity from the GaN/p-Si heterojunction diode is ∼3 orders of magnitude higher as compared to the conventional Si only counterpart. The enhanced infrared light emission is attributed to the improved injector efficiency of the GaN/Si diode because of the wide bandgap of the poly-GaN layer and the resulting band discontinuity at the GaN/Si interface.

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    DO - 10.1063/1.5041089

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