Chemical Mechanical Polishing for Integrated Circuits

V. Nguyen Hoang, H. van Kranenburg, P.H. Woerlee

    Research output: Chapter in Book/Report/Conference proceedingChapterProfessional

    Original languageEnglish
    Title of host publicationSTW Halfjaarverslag (14-10-1998)
    PublisherSTW
    Number of pages2
    Publication statusPublished - 14 Oct 1998

    Cite this

    Nguyen Hoang, V., van Kranenburg, H., & Woerlee, P. H. (1998). Chemical Mechanical Polishing for Integrated Circuits. In STW Halfjaarverslag (14-10-1998) STW.