Chemical Mechanical Polishing for Integrated Circuits

V. Nguyen Hoang, H. van Kranenburg, P.H. Woerlee

    Research output: Chapter in Book/Report/Conference proceedingChapterProfessional

    Original languageEnglish
    Title of host publicationSTW Halfjaarverslag (15-01-1998)
    PublisherSTW
    Number of pages2
    Publication statusPublished - 15 Jan 1998

    Cite this

    Nguyen Hoang, V., van Kranenburg, H., & Woerlee, P. H. (1998). Chemical Mechanical Polishing for Integrated Circuits. In STW Halfjaarverslag (15-01-1998) STW.
    Nguyen Hoang, V. ; van Kranenburg, H. ; Woerlee, P.H. / Chemical Mechanical Polishing for Integrated Circuits. STW Halfjaarverslag (15-01-1998). STW, 1998.
    @inbook{a2ab9818c79d4b1fa496df3ca8ff8a32,
    title = "Chemical Mechanical Polishing for Integrated Circuits",
    author = "{Nguyen Hoang}, V. and {van Kranenburg}, H. and P.H. Woerlee",
    year = "1998",
    month = "1",
    day = "15",
    language = "English",
    booktitle = "STW Halfjaarverslag (15-01-1998)",
    publisher = "STW",

    }

    Nguyen Hoang, V, van Kranenburg, H & Woerlee, PH 1998, Chemical Mechanical Polishing for Integrated Circuits. in STW Halfjaarverslag (15-01-1998). STW.

    Chemical Mechanical Polishing for Integrated Circuits. / Nguyen Hoang, V.; van Kranenburg, H.; Woerlee, P.H.

    STW Halfjaarverslag (15-01-1998). STW, 1998.

    Research output: Chapter in Book/Report/Conference proceedingChapterProfessional

    TY - CHAP

    T1 - Chemical Mechanical Polishing for Integrated Circuits

    AU - Nguyen Hoang, V.

    AU - van Kranenburg, H.

    AU - Woerlee, P.H.

    PY - 1998/1/15

    Y1 - 1998/1/15

    M3 - Chapter

    BT - STW Halfjaarverslag (15-01-1998)

    PB - STW

    ER -

    Nguyen Hoang V, van Kranenburg H, Woerlee PH. Chemical Mechanical Polishing for Integrated Circuits. In STW Halfjaarverslag (15-01-1998). STW. 1998