Chemical solution deposition of oxide thin films

Johan E. ten Elshof*

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingChapterAcademicpeer-review

1 Citation (Scopus)

Abstract

The chemical solution deposition (CSD) process is a wet-chemical process that is employed to fabricate a wide variety of amorphous and crystalline oxide thin films. This chapter describes the typical steps in a CSD process and their influence on the final microstructure and properties of films, and provides an overview of the different types of CSD processes. Some examples of CSD-derived oxide films are discussed.

Original languageEnglish
Title of host publicationEpitaxial Growth of Complex Metal Oxides
Subtitle of host publicationSecond Edition
PublisherElsevier
Chapter4
Pages75-100
Number of pages26
ISBN (Electronic)9780081029459
ISBN (Print)9780081029466
DOIs
Publication statusPublished - 1 Jan 2022

Keywords

  • CSD
  • Epitaxial films
  • MOD
  • Oxide
  • Sol–gel
  • NLA

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