Chemical solution deposition of oxide thin films

Johan E. ten Elshof

doi:10.1016/B978-0-08-102945-9.00012-5

Chemical solution deposition of oxide thin films

Johan E. ten Elshof^*

^*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceeding › Chapter › Academic › peer-review

5 Citations (Scopus)

202 Downloads (Pure)

Abstract

The chemical solution deposition (CSD) process is a wet-chemical process that is employed to fabricate a wide variety of amorphous and crystalline oxide thin films. This chapter describes the typical steps in a CSD process and their influence on the final microstructure and properties of films, and provides an overview of the different types of CSD processes. Some examples of CSD-derived oxide films are discussed.

Original language	English
Title of host publication	Epitaxial Growth of Complex Metal Oxides
Subtitle of host publication	Second Edition
Publisher	Elsevier
Chapter	4
Pages	75-100
Number of pages	26
Edition	2nd
ISBN (Electronic)	9780081029459
ISBN (Print)	9780081029466
DOIs	https://doi.org/10.1016/B978-0-08-102945-9.00012-5
Publication status	Published - 1 Jan 2022

Publication series

Name	Woodhead Publishing Series in Electronic and Optical Materials

Keywords

2024 OA procedure
Epitaxial films
MOD
Oxide
Sol–gel

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10.1016/B978-0-08-102945-9.00012-5

3-s2.0-B9780081029459000125-mainFinal published version, 1.66 MBLicence: Taverne

Cite this

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AB - The chemical solution deposition (CSD) process is a wet-chemical process that is employed to fabricate a wide variety of amorphous and crystalline oxide thin films. This chapter describes the typical steps in a CSD process and their influence on the final microstructure and properties of films, and provides an overview of the different types of CSD processes. Some examples of CSD-derived oxide films are discussed.

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KW - Epitaxial films

KW - MOD

KW - Oxide

KW - Sol–gel

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PB - Elsevier

ER -

Chemical solution deposition of oxide thin films

Abstract

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Keywords

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