Chemical solution deposition techniques for epitaxial growth of complex oxides

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Abstract

The chemical solution deposition (CSD) process is a wet-chemical process that is employed to fabricate a wide variety of amorphous and crystalline oxide thin films. This chapter describes the typical steps in a CSD process and their influence on the final microstructure and properties of films, and provides an overview of the different types of CSD processes. Some examples of CSD-derived oxide films are discussed
Original languageUndefined
Title of host publicationEpitaxial Growth of Complex Metal Oxides
EditorsG. Koster, Mark Huijben, G. Rijnders
Place of PublicationCambridge, UK
PublisherWoodhead Publishing
Pages69-93
Number of pages486
ISBN (Print)978-1-78242-245-7
DOIs
Publication statusPublished - 2015

Publication series

NameWoodhead Publishing Series in Electronic and Optical Materials
PublisherWoodhead Publishing

Keywords

  • METIS-310906
  • IR-96673

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