Chemical titration of clean silicon surfaces with N2O and O2: Atomic nature of "5x1" reconstructed Si(110)

Enrico G. Keim, Herbert Wormeester, Arend van Silfhout

Research output: Contribution to journalArticleAcademicpeer-review

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Abstract

Using spectroscopic differential reflectometry (SDR), Auger electron spectroscopy (AES), and low-energy electron diffraction (LEED) we have studied the room temperature adsorption behavior of N2O and O2 at the clean low-Miller index Si surfaces
Original languageUndefined
Pages (from-to)2747-2754
JournalJournal of vacuum science and technology A: vacuum, surfaces, and films
Volume8
Issue number3
DOIs
Publication statusPublished - 1990

Keywords

  • METIS-128483
  • IR-23684

Cite this

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title = "Chemical titration of clean silicon surfaces with N2O and O2: Atomic nature of {"}5x1{"} reconstructed Si(110)",
abstract = "Using spectroscopic differential reflectometry (SDR), Auger electron spectroscopy (AES), and low-energy electron diffraction (LEED) we have studied the room temperature adsorption behavior of N2O and O2 at the clean low-Miller index Si surfaces",
keywords = "METIS-128483, IR-23684",
author = "Keim, {Enrico G.} and Herbert Wormeester and {van Silfhout}, Arend",
year = "1990",
doi = "10.1116/1.576661",
language = "Undefined",
volume = "8",
pages = "2747--2754",
journal = "Journal of vacuum science and technology A: vacuum, surfaces, and films",
issn = "0734-2101",
publisher = "AVS Science and Technology Society",
number = "3",

}

Chemical titration of clean silicon surfaces with N2O and O2: Atomic nature of "5x1" reconstructed Si(110). / Keim, Enrico G.; Wormeester, Herbert; van Silfhout, Arend.

In: Journal of vacuum science and technology A: vacuum, surfaces, and films, Vol. 8, No. 3, 1990, p. 2747-2754.

Research output: Contribution to journalArticleAcademicpeer-review

TY - JOUR

T1 - Chemical titration of clean silicon surfaces with N2O and O2: Atomic nature of "5x1" reconstructed Si(110)

AU - Keim, Enrico G.

AU - Wormeester, Herbert

AU - van Silfhout, Arend

PY - 1990

Y1 - 1990

N2 - Using spectroscopic differential reflectometry (SDR), Auger electron spectroscopy (AES), and low-energy electron diffraction (LEED) we have studied the room temperature adsorption behavior of N2O and O2 at the clean low-Miller index Si surfaces

AB - Using spectroscopic differential reflectometry (SDR), Auger electron spectroscopy (AES), and low-energy electron diffraction (LEED) we have studied the room temperature adsorption behavior of N2O and O2 at the clean low-Miller index Si surfaces

KW - METIS-128483

KW - IR-23684

U2 - 10.1116/1.576661

DO - 10.1116/1.576661

M3 - Article

VL - 8

SP - 2747

EP - 2754

JO - Journal of vacuum science and technology A: vacuum, surfaces, and films

JF - Journal of vacuum science and technology A: vacuum, surfaces, and films

SN - 0734-2101

IS - 3

ER -