Chemical titration of clean silicon surfaces with N2O and O2: Atomic nature of "5x1" reconstructed Si(110)

Enrico G. Keim; Herbert Wormeester; Arend van Silfhout

doi:10.1116/1.576661

Chemical titration of clean silicon surfaces with N2O and O2: Atomic nature of "5x1" reconstructed Si(110)

Enrico G. Keim, Herbert Wormeester, Arend van Silfhout

Research output: Contribution to journal › Article › Academic › peer-review

21 Citations (Scopus)

178 Downloads (Pure)

Abstract

Using spectroscopic differential reflectometry (SDR), Auger electron spectroscopy (AES), and low-energy electron diffraction (LEED) we have studied the room temperature adsorption behavior of N2O and O2 at the clean low-Miller index Si surfaces

Original language	Undefined
Pages (from-to)	2747-2754
Journal	Journal of vacuum science & technology A: vacuum, surfaces, and films
Volume	8
Issue number	3
DOIs	https://doi.org/10.1116/1.576661
Publication status	Published - 1990

Keywords

METIS-128483
IR-23684

Access to Document

10.1116/1.576661

chemical_titration

Cite this

@article{b7d250eaddec4e129d4df2413774d9ef,

title = "Chemical titration of clean silicon surfaces with N2O and O2: Atomic nature of {"}5x1{"} reconstructed Si(110)",

abstract = "Using spectroscopic differential reflectometry (SDR), Auger electron spectroscopy (AES), and low-energy electron diffraction (LEED) we have studied the room temperature adsorption behavior of N2O and O2 at the clean low-Miller index Si surfaces",

keywords = "METIS-128483, IR-23684",

author = "Keim, {Enrico G.} and Herbert Wormeester and {van Silfhout}, Arend",

year = "1990",

doi = "10.1116/1.576661",

language = "Undefined",

volume = "8",

pages = "2747--2754",

journal = "Journal of vacuum science & technology A: vacuum, surfaces, and films",

issn = "0734-2101",

publisher = "AVS Science and Technology Society",

number = "3",

}

TY - JOUR

T1 - Chemical titration of clean silicon surfaces with N2O and O2: Atomic nature of "5x1" reconstructed Si(110)

AU - Keim, Enrico G.

AU - Wormeester, Herbert

AU - van Silfhout, Arend

PY - 1990

Y1 - 1990

N2 - Using spectroscopic differential reflectometry (SDR), Auger electron spectroscopy (AES), and low-energy electron diffraction (LEED) we have studied the room temperature adsorption behavior of N2O and O2 at the clean low-Miller index Si surfaces

AB - Using spectroscopic differential reflectometry (SDR), Auger electron spectroscopy (AES), and low-energy electron diffraction (LEED) we have studied the room temperature adsorption behavior of N2O and O2 at the clean low-Miller index Si surfaces

KW - METIS-128483

KW - IR-23684

U2 - 10.1116/1.576661

DO - 10.1116/1.576661

M3 - Article

SN - 0734-2101

VL - 8

SP - 2747

EP - 2754

JO - Journal of vacuum science & technology A: vacuum, surfaces, and films

JF - Journal of vacuum science & technology A: vacuum, surfaces, and films

IS - 3

ER -