Chemical vapor deposition and plasma polymerization to produce functionalized silica

Sunkeun Kim, J.R. van Ommen (Contributor), Julien Davin (Contributor), Carla Recker (Contributor), Julia Schoeffel (Contributor), Wilma K. Dierkes (Contributor), Anke Blume (Contributor)

Research output: Contribution to conferencePoster

19 Downloads (Pure)
Original languageEnglish
Publication statusPublished - 10 Dec 2018
EventM2i Conference 2018: Meeting Materials - NH Leeuwenhorst, Noorwijkerhout, Netherlands
Duration: 10 Dec 201811 Dec 2018

Conference

ConferenceM2i Conference 2018
CountryNetherlands
CityNoorwijkerhout
Period10/12/1811/12/18

Keywords

  • plasma materials processing
  • Silica filler
  • modification

Cite this

Kim, S., van Ommen, J. R., Davin, J., Recker, C., Schoeffel, J., Dierkes, W. K., & Blume, A. (2018). Chemical vapor deposition and plasma polymerization to produce functionalized silica. Poster session presented at M2i Conference 2018, Noorwijkerhout, Netherlands.