Chemical vapor deposition growth of bilayer graphene in between molybdenum disulfide sheets

Wojciech Kwieciñski*, Kai Sotthewes, Bene Poelsema, Harold J.W. Zandvliet, Pantelis Bampoulis

*Corresponding author for this work

Research output: Contribution to journalArticleAcademicpeer-review

6 Citations (Scopus)

Abstract

Direct growth of flat micrometer-sized bilayer graphene islands in between molybdenum disulfide sheets is achieved by chemical vapor deposition of ethylene at about 800 °C. The temperature assisted decomposition of ethylene takes place mainly at molybdenum disulfide step edges. The carbon atoms intercalate at this high temperature, and during the deposition process, through defects of the molybdenum disulfide surface such as steps and wrinkles. Post growth atomic force microscopy images reveal that circular flat graphene islands have grown at a high yield. They consist of two graphene layers stacked on top of each other with a total thickness of 0.74 nm. Our results demonstrate direct, simple and high yield growth of graphene/molybdenum disulfide heterostructures, which can be of high importance in future nanoelectronic and optoelectronic applications.

Original languageEnglish
Pages (from-to)776-782
Number of pages7
JournalJournal of colloid and interface science
Volume505
DOIs
Publication statusPublished - 1 Nov 2017

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Keywords

  • 2D materials
  • Chemical vapor deposition
  • Graphene
  • Heterostructures
  • MoS

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