Comb capacitor structures for measurement of post-processed layers

D. Roy; J.H. Klootwijk; N.A.M. Verhaegh; H.H.A.J. Roosen; Robertus A.M. Wolters

doi:10.1109/ICMTS.2008.4509339

Comb capacitor structures for measurement of post-processed layers

D. Roy, J.H. Klootwijk, N.A.M. Verhaegh, H.H.A.J. Roosen, Robertus A.M. Wolters

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

1 Citation (Scopus)

213 Downloads (Pure)

Abstract

We present a simple comb capacitive measurement structure to monitor the properties of post-processed layers. These measurement structures are easily fabricated in a single step in the last metallization layer of a standard IC process, while the post-processing layer in this article is formed over these comb structures by spray coating. The capacitive coupling of the structure on the substrate is modeled based on the electric field distribution around the structure. The change in composition of this post-processed layer is analyzed in terms of measured capacitance values.

Original language	Undefined
Title of host publication	Proceedings of the 21st ICMTS 2008 IEEE Conference on Microelectronic Test Structures
Place of Publication	Piscataway
Publisher	IEEE Computer Society Press
Pages	205-209
Number of pages	6
ISBN (Print)	978-1-4244-1801-5
DOIs	https://doi.org/10.1109/ICMTS.2008.4509339
Publication status	Published - 24 Mar 2008
Event	21st IEEE International Conference on Microelectronic Test Structures, ICMTS 2008 - University of Edinburgh, Edinburgh, United Kingdom Duration: 24 Mar 2008 → 27 Mar 2008 Conference number: 21 http://www.homepages.ed.ac.uk/ajw/ICMTS/prog08.pdf

Publication series

Name
Publisher	IEEE Computer Society Press
Number	DTR08-9

Conference

Conference	21st IEEE International Conference on Microelectronic Test Structures, ICMTS 2008
Abbreviated title	ICMTS
Country	United Kingdom
City	Edinburgh
Period	24/03/08 → 27/03/08
Internet address	http://www.homepages.ed.ac.uk/ajw/ICMTS/prog08.pdf

Keywords

SC-ICF: Integrated Circuit Fabrication
METIS-251078
EWI-13058
IR-64876

Access to Document

10.1109/ICMTS.2008.4509339

roy
open

Cite this

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title = "Comb capacitor structures for measurement of post-processed layers",

abstract = "We present a simple comb capacitive measurement structure to monitor the properties of post-processed layers. These measurement structures are easily fabricated in a single step in the last metallization layer of a standard IC process, while the post-processing layer in this article is formed over these comb structures by spray coating. The capacitive coupling of the structure on the substrate is modeled based on the electric field distribution around the structure. The change in composition of this post-processed layer is analyzed in terms of measured capacitance values.",

keywords = "SC-ICF: Integrated Circuit Fabrication, METIS-251078, EWI-13058, IR-64876",

author = "D. Roy and J.H. Klootwijk and N.A.M. Verhaegh and H.H.A.J. Roosen and Wolters, {Robertus A.M.}",

note = "10.1109/ICMTS.2008.4509339 ; null ; Conference date: 24-03-2008 Through 27-03-2008",

year = "2008",

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publisher = "IEEE Computer Society Press",

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Roy, D, Klootwijk, JH, Verhaegh, NAM, Roosen, HHAJ & Wolters, RAM 2008, Comb capacitor structures for measurement of post-processed layers. in Proceedings of the 21st ICMTS 2008 IEEE Conference on Microelectronic Test Structures., 10.1109/ICMTS.2008.4509339, IEEE Computer Society Press, Piscataway, pp. 205-209, 21st IEEE International Conference on Microelectronic Test Structures, ICMTS 2008, Edinburgh, United Kingdom, 24/03/08. https://doi.org/10.1109/ICMTS.2008.4509339

Comb capacitor structures for measurement of post-processed layers. / Roy, D.; Klootwijk, J.H.; Verhaegh, N.A.M.; Roosen, H.H.A.J.; Wolters, Robertus A.M.

Proceedings of the 21st ICMTS 2008 IEEE Conference on Microelectronic Test Structures. Piscataway : IEEE Computer Society Press, 2008. p. 205-209 10.1109/ICMTS.2008.4509339.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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AU - Klootwijk, J.H.

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AU - Roosen, H.H.A.J.

AU - Wolters, Robertus A.M.

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AB - We present a simple comb capacitive measurement structure to monitor the properties of post-processed layers. These measurement structures are easily fabricated in a single step in the last metallization layer of a standard IC process, while the post-processing layer in this article is formed over these comb structures by spray coating. The capacitive coupling of the structure on the substrate is modeled based on the electric field distribution around the structure. The change in composition of this post-processed layer is analyzed in terms of measured capacitance values.

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