Combined EUV reflectance and X-ray reflectivity data analysis of periodic multilayer structures

S.N. Yakunin, I.A. Makhotkin, K.V. Nikolaev, R.W.E. van de Kruijs, M.A. Chuev, F. Bijkerk

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We present a way to analyze the chemical composition of periodical multilayer structures using the simultaneous analysis of grazing incidence hard X-Ray reflectivity (GIXR) and normal incidence extreme ultraviolet reflectance (EUVR). This allows to combine the high sensitivity of GIXR data to layer and interface thicknesses with the sensitivity of EUVR to the layer densities and atomic compositions. This method was applied to the reconstruction of the layered structure of a LaN/B multilayer mirror with 3.5 nm periodicity. We have compared profiles obtained by simultaneous EUVR and GIXR and GIXR-only data analysis, both reconstructed profiles result in a similar description of the layered structure. However, the simultaneous analysis of both EUVR and GIXR by a single algorithm lead to a ∼2x increased accuracy of the reconstructed layered model, or a more narrow range of solutions, as compared to the GIXR analysis only. It also explains the inherent difficulty of accurately predicting EUV reflectivity from a GIXR-only analysis.
Original languageEnglish
Pages (from-to)20076-20086
Number of pages11
JournalOptics express
Issue number17
Publication statusPublished - 2014


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