Combining retraction edge lithography and plasma etching for arbitrary contour nanoridge fabrication

Yiping Zhao, Henricus V. Jansen, Meint J. de Boer, Johan W. Berenschot, Dominique Bouwes, Miriam Girones nogue, Jurriaan Huskens, Niels Roelof Tas

Research output: Contribution to journalArticleAcademicpeer-review

11 Citations (Scopus)
7 Downloads (Pure)

Fingerprint

Dive into the research topics of 'Combining retraction edge lithography and plasma etching for arbitrary contour nanoridge fabrication'. Together they form a unique fingerprint.

Material Science

Chemical Engineering

Engineering