Comment on 'Nitric oxide adsorption on the Si(100)(2x1) surface - a vibrational study by Y. Taguchi, M. Fujisawa, Y. Kuwahara, M. Onchi and M. Nishijima'

Herbert Wormeester; Arend van Silfhout; Enrico G. Keim; A.G.B.M. Sasse

doi:10.1016/0039-6028(90)90631-H

Comment on 'Nitric oxide adsorption on the Si(100)(2x1) surface - a vibrational study by Y. Taguchi, M. Fujisawa, Y. Kuwahara, M. Onchi and M. Nishijima'

Herbert Wormeester, Arend van Silfhout, Enrico G. Keim, A.G.B.M. Sasse

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Abstract

Both molecular and dissociative adsorption behaviour of NO on the Si(001)(2 × 1) surface at room temperature have been reported. This contradicting difference in adsorption behaviour was obtained from the application of different experimental methods. The attention must be focused on the various sample preparation techniques used and on the influence of primary excitation sources of the different experimental techniques applied on this adsorbed system.

Original language	Undefined
Pages (from-to)	L249-L250
Number of pages	0
Journal	Surface science letters
Volume	0
Issue number	233
DOIs	https://doi.org/10.1016/0039-6028(90)90631-H
Publication status	Published - 1990

Keywords

METIS-128486
IR-23687

Access to Document

10.1016/0039-6028(90)90631-H

comment_on_nitric

Cite this

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title = "Comment on 'Nitric oxide adsorption on the Si(100)(2x1) surface - a vibrational study by Y. Taguchi, M. Fujisawa, Y. Kuwahara, M. Onchi and M. Nishijima'",

abstract = "Both molecular and dissociative adsorption behaviour of NO on the Si(001)(2 × 1) surface at room temperature have been reported. This contradicting difference in adsorption behaviour was obtained from the application of different experimental methods. The attention must be focused on the various sample preparation techniques used and on the influence of primary excitation sources of the different experimental techniques applied on this adsorbed system.",

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author = "Herbert Wormeester and {van Silfhout}, Arend and Keim, {Enrico G.} and A.G.B.M. Sasse",

year = "1990",

doi = "10.1016/0039-6028(90)90631-H",

language = "Undefined",

volume = "0",

pages = "L249--L250",

journal = "Surface science letters",

issn = "0167-2584",

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T1 - Comment on 'Nitric oxide adsorption on the Si(100)(2x1) surface - a vibrational study by Y. Taguchi, M. Fujisawa, Y. Kuwahara, M. Onchi and M. Nishijima'

AU - Wormeester, Herbert

AU - van Silfhout, Arend

AU - Keim, Enrico G.

AU - Sasse, A.G.B.M.

PY - 1990

Y1 - 1990

N2 - Both molecular and dissociative adsorption behaviour of NO on the Si(001)(2 × 1) surface at room temperature have been reported. This contradicting difference in adsorption behaviour was obtained from the application of different experimental methods. The attention must be focused on the various sample preparation techniques used and on the influence of primary excitation sources of the different experimental techniques applied on this adsorbed system.

AB - Both molecular and dissociative adsorption behaviour of NO on the Si(001)(2 × 1) surface at room temperature have been reported. This contradicting difference in adsorption behaviour was obtained from the application of different experimental methods. The attention must be focused on the various sample preparation techniques used and on the influence of primary excitation sources of the different experimental techniques applied on this adsorbed system.

KW - METIS-128486

KW - IR-23687

U2 - 10.1016/0039-6028(90)90631-H

DO - 10.1016/0039-6028(90)90631-H

M3 - Article

SN - 0167-2584

VL - 0

SP - L249-L250

JO - Surface science letters

JF - Surface science letters

IS - 233

ER -