Comparison of H2O and D2O Oxidation Kinetics of Silicon

A.J. Hof, Alexeij Y. Kovalgin, P.H. Woerlee

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    Original languageUndefined
    Title of host publicationProceedings of 5th Annual Workshop on Semiconductors Advances for Future Electronics SAFE 2002
    Place of PublicationUtrecht, The Netherlands
    PublisherSTW
    Pages35-38
    Number of pages4
    ISBN (Print)90-73461-33-2
    Publication statusPublished - 27 Nov 2002
    Event5th Annual Workshop on Semiconductors Advances for Future Electronics, SAFE 2002 - Veldhoven, Netherlands
    Duration: 27 Nov 200228 Nov 2002
    Conference number: 5

    Workshop

    Workshop5th Annual Workshop on Semiconductors Advances for Future Electronics, SAFE 2002
    Abbreviated titleSAFE
    CountryNetherlands
    CityVeldhoven
    Period27/11/0228/11/02

    Keywords

    • METIS-207324

    Cite this

    Hof, A. J., Kovalgin, A. Y., & Woerlee, P. H. (2002). Comparison of H2O and D2O Oxidation Kinetics of Silicon. In Proceedings of 5th Annual Workshop on Semiconductors Advances for Future Electronics SAFE 2002 (pp. 35-38). Utrecht, The Netherlands: STW.