Comparison of H2O and D2O Oxidation Kinetics of Silicon

A.J. Hof, Alexeij Y. Kovalgin, P.H. Woerlee

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    Original languageUndefined
    Title of host publicationProceedings of 5th Annual Workshop on Semiconductors Advances for Future Electronics SAFE 2002
    Place of PublicationUtrecht, The Netherlands
    PublisherSTW
    Pages35-38
    Number of pages4
    ISBN (Print)90-73461-33-2
    Publication statusPublished - 27 Nov 2002
    Event5th Annual Workshop on Semiconductors Advances for Future Electronics, SAFE 2002 - Veldhoven, Netherlands
    Duration: 27 Nov 200228 Nov 2002
    Conference number: 5

    Workshop

    Workshop5th Annual Workshop on Semiconductors Advances for Future Electronics, SAFE 2002
    Abbreviated titleSAFE
    CountryNetherlands
    CityVeldhoven
    Period27/11/0228/11/02

    Keywords

    • METIS-207324

    Cite this

    Hof, A. J., Kovalgin, A. Y., & Woerlee, P. H. (2002). Comparison of H2O and D2O Oxidation Kinetics of Silicon. In Proceedings of 5th Annual Workshop on Semiconductors Advances for Future Electronics SAFE 2002 (pp. 35-38). Utrecht, The Netherlands: STW.
    Hof, A.J. ; Kovalgin, Alexeij Y. ; Woerlee, P.H. / Comparison of H2O and D2O Oxidation Kinetics of Silicon. Proceedings of 5th Annual Workshop on Semiconductors Advances for Future Electronics SAFE 2002. Utrecht, The Netherlands : STW, 2002. pp. 35-38
    @inproceedings{bc53b8f2c96b4e698187d99d31173bef,
    title = "Comparison of H2O and D2O Oxidation Kinetics of Silicon",
    keywords = "METIS-207324",
    author = "A.J. Hof and Kovalgin, {Alexeij Y.} and P.H. Woerlee",
    year = "2002",
    month = "11",
    day = "27",
    language = "Undefined",
    isbn = "90-73461-33-2",
    pages = "35--38",
    booktitle = "Proceedings of 5th Annual Workshop on Semiconductors Advances for Future Electronics SAFE 2002",
    publisher = "STW",

    }

    Hof, AJ, Kovalgin, AY & Woerlee, PH 2002, Comparison of H2O and D2O Oxidation Kinetics of Silicon. in Proceedings of 5th Annual Workshop on Semiconductors Advances for Future Electronics SAFE 2002. STW, Utrecht, The Netherlands, pp. 35-38, 5th Annual Workshop on Semiconductors Advances for Future Electronics, SAFE 2002, Veldhoven, Netherlands, 27/11/02.

    Comparison of H2O and D2O Oxidation Kinetics of Silicon. / Hof, A.J.; Kovalgin, Alexeij Y.; Woerlee, P.H.

    Proceedings of 5th Annual Workshop on Semiconductors Advances for Future Electronics SAFE 2002. Utrecht, The Netherlands : STW, 2002. p. 35-38.

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    TY - GEN

    T1 - Comparison of H2O and D2O Oxidation Kinetics of Silicon

    AU - Hof, A.J.

    AU - Kovalgin, Alexeij Y.

    AU - Woerlee, P.H.

    PY - 2002/11/27

    Y1 - 2002/11/27

    KW - METIS-207324

    M3 - Conference contribution

    SN - 90-73461-33-2

    SP - 35

    EP - 38

    BT - Proceedings of 5th Annual Workshop on Semiconductors Advances for Future Electronics SAFE 2002

    PB - STW

    CY - Utrecht, The Netherlands

    ER -

    Hof AJ, Kovalgin AY, Woerlee PH. Comparison of H2O and D2O Oxidation Kinetics of Silicon. In Proceedings of 5th Annual Workshop on Semiconductors Advances for Future Electronics SAFE 2002. Utrecht, The Netherlands: STW. 2002. p. 35-38