Mass loss or gain in transition metals exposed to energetic particles is relevant to many applications, from thin film processing, to EUV lithography, and fusion research. Understanding the interaction of ions with surfaces near the sputter threshold becomes essential in ascertaining damage to metallic films, whether it’s ‘fuzz’ growth in tungsten, target poisoning in coating technologies or mirror degradation in EUV lithography. We compare the sputtering of transition metals such as Mo, W and Ru under neon, nitrogen and oxygen ion exposure in the energy range of 50-300 eV. Monte Carlo simulations using TRIDYN are performed to evaluate the surface binding energy and composition of the steady state sputtered surface.
|Publication status||Published - 21 Jan 2019|
|Event||Physics@Veldhoven 2019 - De Koningshof, Veldhoven, Netherlands|
Duration: 22 Jan 2019 → 23 Jan 2019
|Period||22/01/19 → 23/01/19|