Comparison of Sputtering of Transition Metals by Reactive Ion Bombardment

Research output: Contribution to conferencePosterAcademic

3 Downloads (Pure)

Abstract

Mass loss or gain in transition metals exposed to energetic particles is relevant to many applications, from thin film processing, to EUV lithography, and fusion research. Understanding the interaction of ions with surfaces near the sputter threshold becomes essential in ascertaining damage to metallic films, whether it’s ‘fuzz’ growth in tungsten, target poisoning in coating technologies or mirror degradation in EUV lithography. We compare the sputtering of transition metals such as Mo, W and Ru under neon, nitrogen and oxygen ion exposure in the energy range of 50-300 eV. Monte Carlo simulations using TRIDYN are performed to evaluate the surface binding energy and composition of the steady state sputtered surface.
Original languageEnglish
Publication statusPublished - 21 Jan 2019

Fingerprint

bombardment
sputtering
transition metals
lithography
ions
nitrogen ions
poisoning
energetic particles
oxygen ions
neon
coating
tungsten
fusion
binding energy
mirrors
degradation
damage
thresholds
thin films
simulation

Cite this

@conference{c48fd7e19c2e434eaed862fe435291bf,
title = "Comparison of Sputtering of Transition Metals by Reactive Ion Bombardment",
abstract = "Mass loss or gain in transition metals exposed to energetic particles is relevant to many applications, from thin film processing, to EUV lithography, and fusion research. Understanding the interaction of ions with surfaces near the sputter threshold becomes essential in ascertaining damage to metallic films, whether it’s ‘fuzz’ growth in tungsten, target poisoning in coating technologies or mirror degradation in EUV lithography. We compare the sputtering of transition metals such as Mo, W and Ru under neon, nitrogen and oxygen ion exposure in the energy range of 50-300 eV. Monte Carlo simulations using TRIDYN are performed to evaluate the surface binding energy and composition of the steady state sputtered surface.",
author = "Parikshit Phadke and J.M. Sturm and {van de Kruijs}, {Robbert W.E.} and F. Bijkerk",
year = "2019",
month = "1",
day = "21",
language = "English",

}

TY - CONF

T1 - Comparison of Sputtering of Transition Metals by Reactive Ion Bombardment

AU - Phadke, Parikshit

AU - Sturm, J.M.

AU - van de Kruijs, Robbert W.E.

AU - Bijkerk, F.

PY - 2019/1/21

Y1 - 2019/1/21

N2 - Mass loss or gain in transition metals exposed to energetic particles is relevant to many applications, from thin film processing, to EUV lithography, and fusion research. Understanding the interaction of ions with surfaces near the sputter threshold becomes essential in ascertaining damage to metallic films, whether it’s ‘fuzz’ growth in tungsten, target poisoning in coating technologies or mirror degradation in EUV lithography. We compare the sputtering of transition metals such as Mo, W and Ru under neon, nitrogen and oxygen ion exposure in the energy range of 50-300 eV. Monte Carlo simulations using TRIDYN are performed to evaluate the surface binding energy and composition of the steady state sputtered surface.

AB - Mass loss or gain in transition metals exposed to energetic particles is relevant to many applications, from thin film processing, to EUV lithography, and fusion research. Understanding the interaction of ions with surfaces near the sputter threshold becomes essential in ascertaining damage to metallic films, whether it’s ‘fuzz’ growth in tungsten, target poisoning in coating technologies or mirror degradation in EUV lithography. We compare the sputtering of transition metals such as Mo, W and Ru under neon, nitrogen and oxygen ion exposure in the energy range of 50-300 eV. Monte Carlo simulations using TRIDYN are performed to evaluate the surface binding energy and composition of the steady state sputtered surface.

M3 - Poster

ER -