Comparison of three types of redox active polymer for two photon stereolithography

Laura Folkertsma-Hendriks; Kaihuan Zhang; Mark A. Hempenius; Gyula J. Vancso; Albert van den Berg; Mathieu Odijk

doi:10.1002/pat.3998

Comparison of three types of redox active polymer for two photon stereolithography

Laura Folkertsma-Hendriks, Kaihuan Zhang, Mark A. Hempenius, Gyula J. Vancso, Albert van den Berg, Mathieu Odijk^*

^*Corresponding author for this work

Research output: Contribution to journal › Article › Academic › peer-review

2 Citations (Scopus)

81 Downloads (Pure)

Abstract

Three-dimensional printing and stereolithography of functional materials for nanofabrication have recently generated a big amount of interest, as have responsive materials. We have investigated the applicability of the redox-responsive polymer poly(ferrocenylsilane) (PFS) for stereolithography purposes. Three types of PFS were synthesized, each functionalized with specific properties to make them interesting for use in nanofabrication. These properties include various stiffness, crosslink densities and hydrophobicities. One of the three PFSs is polycationic, therefore resulting in a hydrogel structure. We show structures fabricated from these materials. Common challenges in using new materials such as these for two-photon stereolithography are discussed

Original language	English
Pages (from-to)	1194-1197
Number of pages	4
Journal	Polymers for advanced technologies
Volume	28
Issue number	9
DOIs	https://doi.org/10.1002/pat.3998
Publication status	Published - 1 Sep 2017

Keywords

EC Grant Agreement nr.: NWO 728.011.205
IR-103220
METIS-321255

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10.1002/pat.3998

Folkertsma_et_al-2017-Polymers_for_Advanced_Technologies
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Folkertsma-Hendriks, L., Zhang, K., Hempenius, M. A., Vancso, G. J., van den Berg, A., & Odijk, M. (2017). Comparison of three types of redox active polymer for two photon stereolithography. Polymers for advanced technologies, 28(9), 1194-1197. https://doi.org/10.1002/pat.3998

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AU - van den Berg, Albert

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