TY - JOUR
T1 - Comparison of three types of redox active polymer for two photon stereolithography
AU - Folkertsma-Hendriks, Laura
AU - Zhang, Kaihuan
AU - Hempenius, Mark A.
AU - Vancso, G. Julius
AU - van den Berg, Albert
AU - Odijk, Mathieu
N1 - Open access. Online first. Netherlands Organization for Scientific Research. Grant Number: NWO 728.011.205
PY - 2017/9/1
Y1 - 2017/9/1
N2 - Three-dimensional printing and stereolithography of functional materials for nanofabrication have recently generated a big amount of interest, as have responsive materials. We have investigated the applicability of the redox-responsive polymer poly(ferrocenylsilane) (PFS) for stereolithography purposes. Three types of PFS were synthesized, each functionalized with specific properties to make them interesting for use in nanofabrication. These properties include various stiffness, crosslink densities and hydrophobicities. One of the three PFSs is polycationic, therefore resulting in a hydrogel structure. We show structures fabricated from these materials. Common challenges in using new materials such as these for two-photon stereolithography are discussed
AB - Three-dimensional printing and stereolithography of functional materials for nanofabrication have recently generated a big amount of interest, as have responsive materials. We have investigated the applicability of the redox-responsive polymer poly(ferrocenylsilane) (PFS) for stereolithography purposes. Three types of PFS were synthesized, each functionalized with specific properties to make them interesting for use in nanofabrication. These properties include various stiffness, crosslink densities and hydrophobicities. One of the three PFSs is polycationic, therefore resulting in a hydrogel structure. We show structures fabricated from these materials. Common challenges in using new materials such as these for two-photon stereolithography are discussed
KW - EC Grant Agreement nr.: NWO 728.011.205
UR - http://www.scopus.com/inward/record.url?scp=85026895412&partnerID=8YFLogxK
U2 - 10.1002/pat.3998
DO - 10.1002/pat.3998
M3 - Article
SN - 1042-7147
VL - 28
SP - 1194
EP - 1197
JO - Polymers for advanced technologies
JF - Polymers for advanced technologies
IS - 9
ER -
