Comparison of three types of redox active polymer for two photon stereolithography

Laura Folkertsma-Hendriks, Kaihuan Zhang, Mark A. Hempenius, Gyula J. Vancso, Albert van den Berg, Mathieu Odijk*

*Corresponding author for this work

Research output: Contribution to journal › Article › Academic › peer-review

2 Citations (Scopus)
72 Downloads (Pure)

Abstract

Three-dimensional printing and stereolithography of functional materials for nanofabrication have recently generated a big amount of interest, as have responsive materials. We have investigated the applicability of the redox-responsive polymer poly(ferrocenylsilane) (PFS) for stereolithography purposes. Three types of PFS were synthesized, each functionalized with specific properties to make them interesting for use in nanofabrication. These properties include various stiffness, crosslink densities and hydrophobicities. One of the three PFSs is polycationic, therefore resulting in a hydrogel structure. We show structures fabricated from these materials. Common challenges in using new materials such as these for two-photon stereolithography are discussed
Original languageEnglish
Pages (from-to)1194-1197
Number of pages4
JournalPolymers for advanced technologies
Volume28
Issue number9
DOIs
Publication statusPublished - 1 Sep 2017

Fingerprint

Stereolithography
Polymers
Photons
Nanotechnology
3D printers
Functional materials
Hydrogel
Hydrophobicity
Hydrogels
Stiffness
Oxidation-Reduction

Keywords

  • EC Grant Agreement nr.: NWO 728.011.205
  • IR-103220
  • METIS-321255

Cite this

Folkertsma-Hendriks, Laura ; Zhang, Kaihuan ; Hempenius, Mark A. ; Vancso, Gyula J. ; van den Berg, Albert ; Odijk, Mathieu. / Comparison of three types of redox active polymer for two photon stereolithography. In: Polymers for advanced technologies. 2017 ; Vol. 28, No. 9. pp. 1194-1197.
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Folkertsma-Hendriks, L, Zhang, K, Hempenius, MA, Vancso, GJ, van den Berg, A & Odijk, M 2017, 'Comparison of three types of redox active polymer for two photon stereolithography', Polymers for advanced technologies, vol. 28, no. 9, pp. 1194-1197. https://doi.org/10.1002/pat.3998

Comparison of three types of redox active polymer for two photon stereolithography. / Folkertsma-Hendriks, Laura; Zhang, Kaihuan; Hempenius, Mark A.; Vancso, Gyula J.; van den Berg, Albert; Odijk, Mathieu.

In: Polymers for advanced technologies, Vol. 28, No. 9, 01.09.2017, p. 1194-1197.

Research output: Contribution to journal › Article › Academic › peer-review

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AU - Folkertsma-Hendriks, Laura

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AU - Hempenius, Mark A.

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AU - van den Berg, Albert

AU - Odijk, Mathieu

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Folkertsma-Hendriks L, Zhang K, Hempenius MA, Vancso GJ, van den Berg A, Odijk M. Comparison of three types of redox active polymer for two photon stereolithography. Polymers for advanced technologies. 2017 Sep 1;28(9):1194-1197. https://doi.org/10.1002/pat.3998

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