Comparison of three types of redox active polymer for two photon stereolithography

Laura Folkertsma-Hendriks, Kaihuan Zhang, Mark A. Hempenius, Gyula J. Vancso, Albert van den Berg, Mathieu Odijk*

*Corresponding author for this work

Research output: Contribution to journalArticleAcademicpeer-review

2 Citations (Scopus)
81 Downloads (Pure)

Abstract

Three-dimensional printing and stereolithography of functional materials for nanofabrication have recently generated a big amount of interest, as have responsive materials. We have investigated the applicability of the redox-responsive polymer poly(ferrocenylsilane) (PFS) for stereolithography purposes. Three types of PFS were synthesized, each functionalized with specific properties to make them interesting for use in nanofabrication. These properties include various stiffness, crosslink densities and hydrophobicities. One of the three PFSs is polycationic, therefore resulting in a hydrogel structure. We show structures fabricated from these materials. Common challenges in using new materials such as these for two-photon stereolithography are discussed
Original languageEnglish
Pages (from-to)1194-1197
Number of pages4
JournalPolymers for advanced technologies
Volume28
Issue number9
DOIs
Publication statusPublished - 1 Sep 2017

Keywords

  • EC Grant Agreement nr.: NWO 728.011.205
  • IR-103220
  • METIS-321255

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