Complex plume stoichiometry during pulsed laser deposition of SrVO3 at low oxygen pressures

Jun Wang, Guus Rijnders, Gertjan Koster* (Corresponding Author)

*Corresponding author for this work

Research output: Contribution to journalArticleAcademicpeer-review

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Abstract

To control the pulsed laser deposition synthesis, knowledge on the relationship between the plasma plume and the grown thin film is required. We show that the oxidation of species in the plasma plume still affects the SrVO3 growth even at low oxygen partial pressures. Optical emission spectroscopy measurements for the plasma plume at different growth conditions were correlated with the film properties determined by Atomic force microscopy, X-ray diffraction, and transport. At reducing oxygen pressures, the background argon pressure can affect the oxidation in the plasma plume, which in turn controls the growth kinetics, stoichiometry, and electrical properties of the films.

Original languageEnglish
Article number223103
JournalApplied physics letters
Volume113
Issue number22
DOIs
Publication statusPublished - 26 Nov 2018

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