Computer simulation of orientation dependent Si etching

E. van Veenendaal, J. van Suchtelen

    Research output: Other contributionOther research output

    Original languageUndefined
    Place of PublicationDish Hotel, Enschede
    Publication statusPublished - 11 Jun 1997

    Keywords

    • METIS-114696

    Cite this

    van Veenendaal, E., & van Suchtelen, J. (1997, Jun 11). Computer simulation of orientation dependent Si etching. Dish Hotel, Enschede.