Computer simulation of orientation dependent Si etching

E. van Veenendaal, J. van Suchtelen

    Research output: Other contributionOther research output

    Original languageUndefined
    Place of PublicationDish Hotel, Enschede
    Publication statusPublished - 11 Jun 1997

    Keywords

    • METIS-114696

    Cite this

    van Veenendaal, E., & van Suchtelen, J. (1997, Jun 11). Computer simulation of orientation dependent Si etching. Dish Hotel, Enschede.
    van Veenendaal, E. ; van Suchtelen, J. / Computer simulation of orientation dependent Si etching. 1997. Dish Hotel, Enschede.
    @misc{d903e0b2c0154401b491a33d445753c4,
    title = "Computer simulation of orientation dependent Si etching",
    keywords = "METIS-114696",
    author = "{van Veenendaal}, E. and {van Suchtelen}, J.",
    year = "1997",
    month = "6",
    day = "11",
    language = "Undefined",
    type = "Other",

    }

    van Veenendaal, E & van Suchtelen, J 1997, Computer simulation of orientation dependent Si etching. Dish Hotel, Enschede.

    Computer simulation of orientation dependent Si etching. / van Veenendaal, E.; van Suchtelen, J.

    Dish Hotel, Enschede. 1997, .

    Research output: Other contributionOther research output

    TY - GEN

    T1 - Computer simulation of orientation dependent Si etching

    AU - van Veenendaal, E.

    AU - van Suchtelen, J.

    PY - 1997/6/11

    Y1 - 1997/6/11

    KW - METIS-114696

    M3 - Other contribution

    CY - Dish Hotel, Enschede

    ER -

    van Veenendaal E, van Suchtelen J. Computer simulation of orientation dependent Si etching. 1997.