Computer simulation of orientation-dependent Si-etching

E. van Veenendaal, J. van Suchtelen

    Research output: Other contributionOther research output

    Original languageUndefined
    Place of PublicationLunteren
    Publication statusPublished - 9 Jan 1997

    Keywords

    • METIS-114702

    Cite this

    van Veenendaal, E., & van Suchtelen, J. (1997, Jan 9). Computer simulation of orientation-dependent Si-etching. Lunteren.
    van Veenendaal, E. ; van Suchtelen, J. / Computer simulation of orientation-dependent Si-etching. 1997. Lunteren.
    @misc{6f576d47675c4200945fe54d82517bef,
    title = "Computer simulation of orientation-dependent Si-etching",
    keywords = "METIS-114702",
    author = "{van Veenendaal}, E. and {van Suchtelen}, J.",
    year = "1997",
    month = "1",
    day = "9",
    language = "Undefined",
    type = "Other",

    }

    van Veenendaal, E & van Suchtelen, J 1997, Computer simulation of orientation-dependent Si-etching. Lunteren.

    Computer simulation of orientation-dependent Si-etching. / van Veenendaal, E.; van Suchtelen, J.

    Lunteren. 1997, .

    Research output: Other contributionOther research output

    TY - GEN

    T1 - Computer simulation of orientation-dependent Si-etching

    AU - van Veenendaal, E.

    AU - van Suchtelen, J.

    PY - 1997/1/9

    Y1 - 1997/1/9

    KW - METIS-114702

    M3 - Other contribution

    CY - Lunteren

    ER -

    van Veenendaal E, van Suchtelen J. Computer simulation of orientation-dependent Si-etching. 1997.