Computers and chemical engineering: Special issue ESCAPE-29

Anton A. Kiss*, Edwin Zondervan, Richard Lakerveld, Leyla Özkan

*Corresponding author for this work

Research output: Contribution to journalEditorialAcademicpeer-review

Abstract

This special issue of Computers & Chemical Engineering includes extended versions of selected papers from the 29th European Symposium on Computer-Aided Process Engineering (ESCAPE-29), held in Eindhoven, The Netherlands, during 16–19th of June 2019. These papers were recommended by the International Scientific Committee and constitute a representative sample of the invited plenary lectures, invited keynote lectures, and contributed papers.
Original languageEnglish
Article number106992
JournalComputers & chemical engineering
Volume141
DOIs
Publication statusPublished - 4 Oct 2020
Externally publishedYes

Fingerprint

Dive into the research topics of 'Computers and chemical engineering: Special issue ESCAPE-29'. Together they form a unique fingerprint.

Cite this