Contact chain measurements for ultrathin conducting films

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

Abstract

Test structures for the electrical characterization of ultrathin conductive (ALD) films are presented based on electrodes on which the ultrathin film is deposited. The contact resistance of the buried electrodes to the ultrathin ALD TiN films is investigated using contact chain structures. This work includes test structure design and fabrication, and the electrical characterization of ALD TiN films down to 4 nm in thickness. It is shown that contact chain structures with buried electrodes can be used successfully to characterize the contact resistance to sub 10 nm ALD TiN films
Original languageUndefined
Title of host publicationProceedings of the 12th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors
Place of PublicationUtrecht, The Netherlands
PublisherSTW
Pages150-152
Number of pages3
ISBN (Print)978-90-73461-62-8
Publication statusPublished - 26 Nov 2009
Event12th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors, SAFE 2009 - Veldhoven, Netherlands
Duration: 26 Nov 200927 Nov 2009
Conference number: 12

Publication series

Name
PublisherTechnology Foundation STW

Conference

Conference12th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors, SAFE 2009
Abbreviated titleSAFE
CountryNetherlands
CityVeldhoven
Period26/11/0927/11/09

Keywords

  • METIS-264270
  • Atomic Layer Deposition
  • Contact resistance
  • SC-ICS: Integrated Chemical Sensors
  • Titanium Nitride
  • Test structure
  • EWI-17062
  • IR-69054

Cite this

Groenland, A. W., Wolters, R. A. M., Kovalgin, A. Y., & Schmitz, J. (2009). Contact chain measurements for ultrathin conducting films. In Proceedings of the 12th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors (pp. 150-152). Utrecht, The Netherlands: STW.
Groenland, A.W. ; Wolters, Robertus A.M. ; Kovalgin, Alexeij Y. ; Schmitz, Jurriaan. / Contact chain measurements for ultrathin conducting films. Proceedings of the 12th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors. Utrecht, The Netherlands : STW, 2009. pp. 150-152
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abstract = "Test structures for the electrical characterization of ultrathin conductive (ALD) films are presented based on electrodes on which the ultrathin film is deposited. The contact resistance of the buried electrodes to the ultrathin ALD TiN films is investigated using contact chain structures. This work includes test structure design and fabrication, and the electrical characterization of ALD TiN films down to 4 nm in thickness. It is shown that contact chain structures with buried electrodes can be used successfully to characterize the contact resistance to sub 10 nm ALD TiN films",
keywords = "METIS-264270, Atomic Layer Deposition, Contact resistance, SC-ICS: Integrated Chemical Sensors, Titanium Nitride, Test structure, EWI-17062, IR-69054",
author = "A.W. Groenland and Wolters, {Robertus A.M.} and Kovalgin, {Alexeij Y.} and Jurriaan Schmitz",
year = "2009",
month = "11",
day = "26",
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isbn = "978-90-73461-62-8",
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booktitle = "Proceedings of the 12th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors",

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Groenland, AW, Wolters, RAM, Kovalgin, AY & Schmitz, J 2009, Contact chain measurements for ultrathin conducting films. in Proceedings of the 12th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors. STW, Utrecht, The Netherlands, pp. 150-152, 12th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors, SAFE 2009, Veldhoven, Netherlands, 26/11/09.

Contact chain measurements for ultrathin conducting films. / Groenland, A.W.; Wolters, Robertus A.M.; Kovalgin, Alexeij Y.; Schmitz, Jurriaan.

Proceedings of the 12th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors. Utrecht, The Netherlands : STW, 2009. p. 150-152.

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

TY - GEN

T1 - Contact chain measurements for ultrathin conducting films

AU - Groenland, A.W.

AU - Wolters, Robertus A.M.

AU - Kovalgin, Alexeij Y.

AU - Schmitz, Jurriaan

PY - 2009/11/26

Y1 - 2009/11/26

N2 - Test structures for the electrical characterization of ultrathin conductive (ALD) films are presented based on electrodes on which the ultrathin film is deposited. The contact resistance of the buried electrodes to the ultrathin ALD TiN films is investigated using contact chain structures. This work includes test structure design and fabrication, and the electrical characterization of ALD TiN films down to 4 nm in thickness. It is shown that contact chain structures with buried electrodes can be used successfully to characterize the contact resistance to sub 10 nm ALD TiN films

AB - Test structures for the electrical characterization of ultrathin conductive (ALD) films are presented based on electrodes on which the ultrathin film is deposited. The contact resistance of the buried electrodes to the ultrathin ALD TiN films is investigated using contact chain structures. This work includes test structure design and fabrication, and the electrical characterization of ALD TiN films down to 4 nm in thickness. It is shown that contact chain structures with buried electrodes can be used successfully to characterize the contact resistance to sub 10 nm ALD TiN films

KW - METIS-264270

KW - Atomic Layer Deposition

KW - Contact resistance

KW - SC-ICS: Integrated Chemical Sensors

KW - Titanium Nitride

KW - Test structure

KW - EWI-17062

KW - IR-69054

M3 - Conference contribution

SN - 978-90-73461-62-8

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BT - Proceedings of the 12th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors

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Groenland AW, Wolters RAM, Kovalgin AY, Schmitz J. Contact chain measurements for ultrathin conducting films. In Proceedings of the 12th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors. Utrecht, The Netherlands: STW. 2009. p. 150-152