Contact chain measurements for ultrathin conducting films

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

    Abstract

    Test structures for the electrical characterization of ultrathin conductive (ALD) films are presented based on electrodes on which the ultrathin film is deposited. The contact resistance of the buried electrodes to the ultrathin ALD TiN films is investigated using contact chain structures. This work includes test structure design and fabrication, and the electrical characterization of ALD TiN films down to 4 nm in thickness. It is shown that contact chain structures with buried electrodes can be used successfully to characterize the contact resistance to sub 10 nm ALD TiN films
    Original languageUndefined
    Title of host publicationProceedings of the 12th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors
    Place of PublicationUtrecht, The Netherlands
    PublisherSTW
    Pages150-152
    Number of pages3
    ISBN (Print)978-90-73461-62-8
    Publication statusPublished - 26 Nov 2009
    Event12th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors, SAFE 2009 - Veldhoven, Netherlands
    Duration: 26 Nov 200927 Nov 2009
    Conference number: 12

    Publication series

    Name
    PublisherTechnology Foundation STW

    Conference

    Conference12th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors, SAFE 2009
    Abbreviated titleSAFE
    CountryNetherlands
    CityVeldhoven
    Period26/11/0927/11/09

    Keywords

    • METIS-264270
    • Atomic Layer Deposition
    • Contact resistance
    • SC-ICS: Integrated Chemical Sensors
    • Titanium Nitride
    • Test structure
    • EWI-17062
    • IR-69054

    Cite this

    Groenland, A. W., Wolters, R. A. M., Kovalgin, A. Y., & Schmitz, J. (2009). Contact chain measurements for ultrathin conducting films. In Proceedings of the 12th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors (pp. 150-152). Utrecht, The Netherlands: STW.
    Groenland, A.W. ; Wolters, Robertus A.M. ; Kovalgin, Alexeij Y. ; Schmitz, Jurriaan. / Contact chain measurements for ultrathin conducting films. Proceedings of the 12th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors. Utrecht, The Netherlands : STW, 2009. pp. 150-152
    @inproceedings{7a573c497c99446296385058f7053f85,
    title = "Contact chain measurements for ultrathin conducting films",
    abstract = "Test structures for the electrical characterization of ultrathin conductive (ALD) films are presented based on electrodes on which the ultrathin film is deposited. The contact resistance of the buried electrodes to the ultrathin ALD TiN films is investigated using contact chain structures. This work includes test structure design and fabrication, and the electrical characterization of ALD TiN films down to 4 nm in thickness. It is shown that contact chain structures with buried electrodes can be used successfully to characterize the contact resistance to sub 10 nm ALD TiN films",
    keywords = "METIS-264270, Atomic Layer Deposition, Contact resistance, SC-ICS: Integrated Chemical Sensors, Titanium Nitride, Test structure, EWI-17062, IR-69054",
    author = "A.W. Groenland and Wolters, {Robertus A.M.} and Kovalgin, {Alexeij Y.} and Jurriaan Schmitz",
    year = "2009",
    month = "11",
    day = "26",
    language = "Undefined",
    isbn = "978-90-73461-62-8",
    publisher = "STW",
    pages = "150--152",
    booktitle = "Proceedings of the 12th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors",

    }

    Groenland, AW, Wolters, RAM, Kovalgin, AY & Schmitz, J 2009, Contact chain measurements for ultrathin conducting films. in Proceedings of the 12th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors. STW, Utrecht, The Netherlands, pp. 150-152, 12th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors, SAFE 2009, Veldhoven, Netherlands, 26/11/09.

    Contact chain measurements for ultrathin conducting films. / Groenland, A.W.; Wolters, Robertus A.M.; Kovalgin, Alexeij Y.; Schmitz, Jurriaan.

    Proceedings of the 12th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors. Utrecht, The Netherlands : STW, 2009. p. 150-152.

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

    TY - GEN

    T1 - Contact chain measurements for ultrathin conducting films

    AU - Groenland, A.W.

    AU - Wolters, Robertus A.M.

    AU - Kovalgin, Alexeij Y.

    AU - Schmitz, Jurriaan

    PY - 2009/11/26

    Y1 - 2009/11/26

    N2 - Test structures for the electrical characterization of ultrathin conductive (ALD) films are presented based on electrodes on which the ultrathin film is deposited. The contact resistance of the buried electrodes to the ultrathin ALD TiN films is investigated using contact chain structures. This work includes test structure design and fabrication, and the electrical characterization of ALD TiN films down to 4 nm in thickness. It is shown that contact chain structures with buried electrodes can be used successfully to characterize the contact resistance to sub 10 nm ALD TiN films

    AB - Test structures for the electrical characterization of ultrathin conductive (ALD) films are presented based on electrodes on which the ultrathin film is deposited. The contact resistance of the buried electrodes to the ultrathin ALD TiN films is investigated using contact chain structures. This work includes test structure design and fabrication, and the electrical characterization of ALD TiN films down to 4 nm in thickness. It is shown that contact chain structures with buried electrodes can be used successfully to characterize the contact resistance to sub 10 nm ALD TiN films

    KW - METIS-264270

    KW - Atomic Layer Deposition

    KW - Contact resistance

    KW - SC-ICS: Integrated Chemical Sensors

    KW - Titanium Nitride

    KW - Test structure

    KW - EWI-17062

    KW - IR-69054

    M3 - Conference contribution

    SN - 978-90-73461-62-8

    SP - 150

    EP - 152

    BT - Proceedings of the 12th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors

    PB - STW

    CY - Utrecht, The Netherlands

    ER -

    Groenland AW, Wolters RAM, Kovalgin AY, Schmitz J. Contact chain measurements for ultrathin conducting films. In Proceedings of the 12th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors. Utrecht, The Netherlands: STW. 2009. p. 150-152