Contributions of gasphase reactions to the growth rate of LPCVD Silicon Films in the temperature range 500 to 550 ?C

C. Cobianu, P. Cosmin, J. Holleman

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    Original languageUndefined
    Title of host publicationElectrochemical Society Proceedings
    Place of PublicationParijs France
    Number of pages8
    Publication statusPublished - 31 Aug 1997


    • METIS-113867

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