Contributions of gasphase reactions to the growth rate of LPCVD Silicon Films in the temperature range 500 to 550 ?C

C. Cobianu, P. Cosmin, J. Holleman

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

Original language	Undefined
Title of host publication	Electrochemical Society Proceedings
Place of Publication	Parijs France
Pages	65-72
Number of pages	8
Publication status	Published - 31 Aug 1997

Keywords

@inproceedings{6a828ef8bcfa48f5bd9e966f34ac1cce,

title = "Contributions of gasphase reactions to the growth rate of LPCVD Silicon Films in the temperature range 500 to 550 ?C",

keywords = "METIS-113867",

author = "C. Cobianu and P. Cosmin and J. Holleman",

year = "1997",

month = aug,

day = "31",

language = "Undefined",

isbn = "1-56677-178-1",

pages = "65--72",

booktitle = "Electrochemical Society Proceedings",

}