Control of YH3 formation and stability via hydrogen surface adsorption and desorption

Olena Soroka; Jacobus M. Sturm; Robbert W.E. van de Kruijs; Chris J. Lee; Fred Bijkerk

doi:10.1016/j.apsusc.2018.05.134

Control of YH₃ formation and stability via hydrogen surface adsorption and desorption

Olena Soroka^* (Corresponding Author), Jacobus M. Sturm, Robbert W.E. van de Kruijs, Chris J. Lee, Fred Bijkerk

^*Corresponding author for this work

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Abstract

Yttrium is known to form two hydrides: YH₂, a metal, and YH₃, which is dielectric. However, the stability of YH₃ is not fully understood, especially in the context of thin films, where the yttrium layer must be coated to protect it from oxidation. In this work, we show that the stability of a YH₃ thin film depends on the capping layer material. Our investigation reveals that YH₃ appears to be stabilized by hydrogen that is adsorbed to the capping layer surface. This is evidenced by the YH₃-YH₂ transition temperature, which was found to be correlated with the desorption temperature of hydrogen from the surface. We posit that surface-adsorbed hydrogen prevents hydrogen from diffusing out of the thin film, which limits YH₃ dissociation to the solubility of hydrogen in the YH₂/YH₃ thin film.

Original language	English
Pages (from-to)	70-74
Number of pages	5
Journal	Applied surface science
Volume	455
DOIs	https://doi.org/10.1016/j.apsusc.2018.05.134
Publication status	Published - 15 Oct 2018

Keywords

Atomic hydrogen
Hydrogenation
Metal thin coatings
Surface desorption
Yttrium hydride
22/3 OA procedure

Access to Document

10.1016/j.apsusc.2018.05.134

Soroka2018controlAccepted author version, 1.45 MBLicence: CC BY-NC-ND
Soroka2018controlFinal published version, 970 KBLicence: Taverne

Cite this

@article{935d9e840ffd4058b1e4f7486241c185,

title = "Control of YH3 formation and stability via hydrogen surface adsorption and desorption",

abstract = "Yttrium is known to form two hydrides: YH2, a metal, and YH3, which is dielectric. However, the stability of YH3 is not fully understood, especially in the context of thin films, where the yttrium layer must be coated to protect it from oxidation. In this work, we show that the stability of a YH3 thin film depends on the capping layer material. Our investigation reveals that YH3 appears to be stabilized by hydrogen that is adsorbed to the capping layer surface. This is evidenced by the YH3-YH2 transition temperature, which was found to be correlated with the desorption temperature of hydrogen from the surface. We posit that surface-adsorbed hydrogen prevents hydrogen from diffusing out of the thin film, which limits YH3 dissociation to the solubility of hydrogen in the YH2/YH3 thin film.",

keywords = "Atomic hydrogen, Hydrogenation, Metal thin coatings, Surface desorption, Yttrium hydride, 22/3 OA procedure",

author = "Olena Soroka and Sturm, {Jacobus M.} and {van de Kruijs}, {Robbert W.E.} and Lee, {Chris J.} and Fred Bijkerk",

year = "2018",

month = oct,

day = "15",

doi = "10.1016/j.apsusc.2018.05.134",

language = "English",

volume = "455",

pages = "70--74",

journal = "Applied surface science",

issn = "0169-4332",

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TY - JOUR

T1 - Control of YH3 formation and stability via hydrogen surface adsorption and desorption

AU - Soroka, Olena

AU - Sturm, Jacobus M.

AU - van de Kruijs, Robbert W.E.

AU - Lee, Chris J.

AU - Bijkerk, Fred

PY - 2018/10/15

Y1 - 2018/10/15

N2 - Yttrium is known to form two hydrides: YH2, a metal, and YH3, which is dielectric. However, the stability of YH3 is not fully understood, especially in the context of thin films, where the yttrium layer must be coated to protect it from oxidation. In this work, we show that the stability of a YH3 thin film depends on the capping layer material. Our investigation reveals that YH3 appears to be stabilized by hydrogen that is adsorbed to the capping layer surface. This is evidenced by the YH3-YH2 transition temperature, which was found to be correlated with the desorption temperature of hydrogen from the surface. We posit that surface-adsorbed hydrogen prevents hydrogen from diffusing out of the thin film, which limits YH3 dissociation to the solubility of hydrogen in the YH2/YH3 thin film.

AB - Yttrium is known to form two hydrides: YH2, a metal, and YH3, which is dielectric. However, the stability of YH3 is not fully understood, especially in the context of thin films, where the yttrium layer must be coated to protect it from oxidation. In this work, we show that the stability of a YH3 thin film depends on the capping layer material. Our investigation reveals that YH3 appears to be stabilized by hydrogen that is adsorbed to the capping layer surface. This is evidenced by the YH3-YH2 transition temperature, which was found to be correlated with the desorption temperature of hydrogen from the surface. We posit that surface-adsorbed hydrogen prevents hydrogen from diffusing out of the thin film, which limits YH3 dissociation to the solubility of hydrogen in the YH2/YH3 thin film.

KW - Atomic hydrogen

KW - Hydrogenation

KW - Metal thin coatings

KW - Surface desorption

KW - Yttrium hydride

KW - 22/3 OA procedure

U2 - 10.1016/j.apsusc.2018.05.134

DO - 10.1016/j.apsusc.2018.05.134

M3 - Article

AN - SCOPUS:85047391630

VL - 455

SP - 70

EP - 74

JO - Applied surface science

JF - Applied surface science

SN - 0169-4332

ER -