Controlled polymer nanostructures by alternative lithography

Canet Acikgoz

Research output: ThesisPhD Thesis - Research UT, graduation UT

86 Downloads (Pure)

Abstract

The main goal pursued in this thesis is to investigate the role of organometallic polymers in bottom-up and top-down nanofabrication techniques to provide patterned platforms. Poly(ferrocenylsilane)s (PFSs) were explored for their use in top-down fabrication since they show a high etch resistance to reactive ion etching (RIE). The PFS polymers synthesized were used as resists in top-down lithographic applications on the micro- and nanometer scales. Phase separation in block copolymers was used to create bottom-up patterns on a nanometer scale. Surface-initiated polymerization (SIP) was performed for the preparation of polymer brush patterns for use in biological applications. Different lithography techniques such as nanoimprint lithography (NIL), UV-nanoimprint lithography (UV-NIL) and nanosphere lithography (NSL) were employed to fabricate patterns of PFS. The patterns fabricated were further utilized to create structures on various polymer and silicon surfaces at different lengthscales. In addition, nanostructured polymer brushes were grafted from a patterned initiator obtained by the step-and-flash imprint lithography (SFIL) process. Block copolymer self-assembly was also used to generate nanoperiodic PFS patterns. Symmetry, pattern quality and correlation as a function of the primary structure of polystyrene-block-poly(ferrocenyldimethylsilane) (PS-b-PFS) is discussed.
Original languageEnglish
Awarding Institution
  • University of Twente
Supervisors/Advisors
  • Huskens, Jurriaan , Supervisor
  • Vancso, Gyula J., Supervisor
  • Hempenius, Mark A., Co-Supervisor
Award date12 Feb 2010
Place of PublicationEnschede
Publisher
Print ISBNs978-90-365-2976-1
DOIs
Publication statusPublished - 12 Feb 2010

Fingerprint

Lithography
Nanostructures
Polymers
Nanoimprint lithography
Brushes
Block copolymers
Nanospheres
Polystyrenes
Reactive ion etching
Organometallics
Silicon
Nanotechnology
Phase separation
Self assembly
Polymerization
Fabrication

Keywords

  • IR-69952

Cite this

Acikgoz, Canet. / Controlled polymer nanostructures by alternative lithography. Enschede : University of Twente, 2010. 146 p.
@phdthesis{696fd343a9d54e38a24978e9eecca1c4,
title = "Controlled polymer nanostructures by alternative lithography",
abstract = "The main goal pursued in this thesis is to investigate the role of organometallic polymers in bottom-up and top-down nanofabrication techniques to provide patterned platforms. Poly(ferrocenylsilane)s (PFSs) were explored for their use in top-down fabrication since they show a high etch resistance to reactive ion etching (RIE). The PFS polymers synthesized were used as resists in top-down lithographic applications on the micro- and nanometer scales. Phase separation in block copolymers was used to create bottom-up patterns on a nanometer scale. Surface-initiated polymerization (SIP) was performed for the preparation of polymer brush patterns for use in biological applications. Different lithography techniques such as nanoimprint lithography (NIL), UV-nanoimprint lithography (UV-NIL) and nanosphere lithography (NSL) were employed to fabricate patterns of PFS. The patterns fabricated were further utilized to create structures on various polymer and silicon surfaces at different lengthscales. In addition, nanostructured polymer brushes were grafted from a patterned initiator obtained by the step-and-flash imprint lithography (SFIL) process. Block copolymer self-assembly was also used to generate nanoperiodic PFS patterns. Symmetry, pattern quality and correlation as a function of the primary structure of polystyrene-block-poly(ferrocenyldimethylsilane) (PS-b-PFS) is discussed.",
keywords = "IR-69952",
author = "Canet Acikgoz",
year = "2010",
month = "2",
day = "12",
doi = "10.3990/1.9789036529761",
language = "English",
isbn = "978-90-365-2976-1",
publisher = "University of Twente",
address = "Netherlands",
school = "University of Twente",

}

Controlled polymer nanostructures by alternative lithography. / Acikgoz, Canet.

Enschede : University of Twente, 2010. 146 p.

Research output: ThesisPhD Thesis - Research UT, graduation UT

TY - THES

T1 - Controlled polymer nanostructures by alternative lithography

AU - Acikgoz, Canet

PY - 2010/2/12

Y1 - 2010/2/12

N2 - The main goal pursued in this thesis is to investigate the role of organometallic polymers in bottom-up and top-down nanofabrication techniques to provide patterned platforms. Poly(ferrocenylsilane)s (PFSs) were explored for their use in top-down fabrication since they show a high etch resistance to reactive ion etching (RIE). The PFS polymers synthesized were used as resists in top-down lithographic applications on the micro- and nanometer scales. Phase separation in block copolymers was used to create bottom-up patterns on a nanometer scale. Surface-initiated polymerization (SIP) was performed for the preparation of polymer brush patterns for use in biological applications. Different lithography techniques such as nanoimprint lithography (NIL), UV-nanoimprint lithography (UV-NIL) and nanosphere lithography (NSL) were employed to fabricate patterns of PFS. The patterns fabricated were further utilized to create structures on various polymer and silicon surfaces at different lengthscales. In addition, nanostructured polymer brushes were grafted from a patterned initiator obtained by the step-and-flash imprint lithography (SFIL) process. Block copolymer self-assembly was also used to generate nanoperiodic PFS patterns. Symmetry, pattern quality and correlation as a function of the primary structure of polystyrene-block-poly(ferrocenyldimethylsilane) (PS-b-PFS) is discussed.

AB - The main goal pursued in this thesis is to investigate the role of organometallic polymers in bottom-up and top-down nanofabrication techniques to provide patterned platforms. Poly(ferrocenylsilane)s (PFSs) were explored for their use in top-down fabrication since they show a high etch resistance to reactive ion etching (RIE). The PFS polymers synthesized were used as resists in top-down lithographic applications on the micro- and nanometer scales. Phase separation in block copolymers was used to create bottom-up patterns on a nanometer scale. Surface-initiated polymerization (SIP) was performed for the preparation of polymer brush patterns for use in biological applications. Different lithography techniques such as nanoimprint lithography (NIL), UV-nanoimprint lithography (UV-NIL) and nanosphere lithography (NSL) were employed to fabricate patterns of PFS. The patterns fabricated were further utilized to create structures on various polymer and silicon surfaces at different lengthscales. In addition, nanostructured polymer brushes were grafted from a patterned initiator obtained by the step-and-flash imprint lithography (SFIL) process. Block copolymer self-assembly was also used to generate nanoperiodic PFS patterns. Symmetry, pattern quality and correlation as a function of the primary structure of polystyrene-block-poly(ferrocenyldimethylsilane) (PS-b-PFS) is discussed.

KW - IR-69952

U2 - 10.3990/1.9789036529761

DO - 10.3990/1.9789036529761

M3 - PhD Thesis - Research UT, graduation UT

SN - 978-90-365-2976-1

PB - University of Twente

CY - Enschede

ER -