Controlling interface chemistry in 6.x nm La/B multilayer optics

Dmitry Kuznetsov; Jacobus Marinus Sturm; Robbert Wilhelmus Elisabeth van de Kruijs; Andrey Yakshin; Eric Louis; Frederik Bijkerk

Controlling interface chemistry in 6.x nm La/B multilayer optics

Dmitry Kuznetsov
, Jacobus Marinus Sturm
, Robbert Wilhelmus Elisabeth van de Kruijs
, Andrey Yakshin
, Eric Louis
, Frederik Bijkerk

XUV Optics

Research output: Contribution to conference › Poster › Other research output

73 Downloads (Pure)

Original language	English
Number of pages	1
Publication status	Published - 5 Oct 2015
Event	2015 International Symposium on Extreme Ultraviolet Lithography - MECC Maastricht, Maastricht, Netherlands Duration: 5 Oct 2015 → 7 Oct 2015 https://www.eiseverywhere.com/ehome/130233/296586/?&&internal=1

Conference

Conference	2015 International Symposium on Extreme Ultraviolet Lithography
Abbreviated title	EUV Litography
Country/Territory	Netherlands
City	Maastricht
Period	5/10/15 → 7/10/15
Internet address	https://www.eiseverywhere.com/ehome/130233/296586/?&&internal=1

Access to Document

Kuznetsov2015controllingFinal published version, 431 KB

Cite this

@conference{e81e060be6d94cb6967b4e32cc3d8a26,

title = "Controlling interface chemistry in 6.x nm La/B multilayer optics",

author = "Dmitry Kuznetsov and Sturm, \{Jacobus Marinus\} and \{van de Kruijs\}, \{Robbert Wilhelmus Elisabeth\} and Andrey Yakshin and Eric Louis and Frederik Bijkerk",

year = "2015",

month = oct,

day = "5",

language = "English",

note = "2015 International Symposium on Extreme Ultraviolet Lithography, EUV Litography ; Conference date: 05-10-2015 Through 07-10-2015",

url = "https://www.eiseverywhere.com/ehome/130233/296586/?\&\&internal=1",

}

TY - CONF

T1 - Controlling interface chemistry in 6.x nm La/B multilayer optics

AU - Kuznetsov, Dmitry

AU - Sturm, Jacobus Marinus

AU - van de Kruijs, Robbert Wilhelmus Elisabeth

AU - Yakshin, Andrey

AU - Louis, Eric

AU - Bijkerk, Frederik

PY - 2015/10/5

Y1 - 2015/10/5

M3 - Poster

T2 - 2015 International Symposium on Extreme Ultraviolet Lithography

Y2 - 5 October 2015 through 7 October 2015

ER -