Copper chemical mechanical polishing: Problem, model and solution

V. Nguyen Hoang, P. van der Velden, R. Daamen, H. van Kranenburg, P.H. Woerlee

    Research output: Other contributionOther research output

    Original languageUndefined
    Place of PublicationEindhoven, The Netherlands
    Publication statusPublished - 22 Sep 2000

    Keywords

    • METIS-114861

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