Copper Chemical Mechanical Polishing Using Fixed-abrasive Polishing Pad

V. Nguyen Hoang, A. Hof, H. van Kranenburg, P.H. Woerlee, F. Weimar

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    Original languageUndefined
    Title of host publicationSAFE'99
    Place of PublicationMierlo, The Netherlands
    Number of pages4
    Publication statusPublished - 24 Nov 1999


    • METIS-113897

    Cite this