Corrections to “MOSFET Degradation Under RF Stress” (IEEE Transactions on Electron Devices (2009) 56(1) (157))

G.T. Sasse, F.G. Kuper, J. Schmitz

Research output: Contribution to journal › Article › Academic › peer-review

Original language	English
Journal	IEEE Transactions on Electron Devices
DOIs	https://doi.org/10.1109/TED.2008.2010698
Publication status	Published - 2009

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