Correlation between Hot Carrier Stress, Oxide Breakdown and Gate Leakage Current for Monitoring Plasma Processing Induced Damage on Gate Oxide

J.G.G. Ackaert; Zhichun Wang; E. Backer; Cora Salm

Correlation between Hot Carrier Stress, Oxide Breakdown and Gate Leakage Current for Monitoring Plasma Processing Induced Damage on Gate Oxide

J.G.G. Ackaert, Zhichun Wang, E. Backer, Cora Salm

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

Original language	Undefined
Title of host publication	Proceedings of 7th International symposium of Plasma Process-Induced Damage
Place of Publication	Santa Clara, California
Publisher	American Vacuum Society
Pages	45-48
Number of pages	4
ISBN (Print)	--
Publication status	Published - 6 Jun 2002

Keywords

METIS-206347

Cite this

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title = "Correlation between Hot Carrier Stress, Oxide Breakdown and Gate Leakage Current for Monitoring Plasma Processing Induced Damage on Gate Oxide",

keywords = "METIS-206347",

author = "J.G.G. Ackaert and Zhichun Wang and E. Backer and Cora Salm",

year = "2002",

month = jun,

day = "6",

language = "Undefined",

isbn = "--",

pages = "45--48",

booktitle = "Proceedings of 7th International symposium of Plasma Process-Induced Damage",

publisher = "American Vacuum Society",

address = "United States",

}

Correlation between Hot Carrier Stress, Oxide Breakdown and Gate Leakage Current for Monitoring Plasma Processing Induced Damage on Gate Oxide. / Ackaert, J.G.G.; Wang, Zhichun; Backer, E. et al.
Proceedings of 7th International symposium of Plasma Process-Induced Damage. Santa Clara, California: American Vacuum Society, 2002. p. 45-48.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Correlation between Hot Carrier Stress, Oxide Breakdown and Gate Leakage Current for Monitoring Plasma Processing Induced Damage on Gate Oxide

AU - Ackaert, J.G.G.

AU - Wang, Zhichun

AU - Backer, E.

AU - Salm, Cora

PY - 2002/6/6

Y1 - 2002/6/6

KW - METIS-206347

M3 - Conference contribution

SN - --

SP - 45

EP - 48

BT - Proceedings of 7th International symposium of Plasma Process-Induced Damage

PB - American Vacuum Society

CY - Santa Clara, California

ER -