Corrigendum to “In situ ellipsometry study of atomic hydrogen etching of extreme ultraviolet induced carbon layers” [Appl. Surf. Sci. 258(1) (2011) 7–12]

Juequan Chen^*, Eric Louis, Rob Harmsen, Tim Tsarfati, Herbert Wormeester, Maarten van Kampen, Willem van Schaik, Robbert van de Kruijs, Fred Bijkerk

^*Corresponding author for this work

Research output: Contribution to journal › Comment/Letter to the editor › Academic › peer-review

37 Downloads (Pure)

1 Article

1 results

2011
In situ ellipsometry study of atomic hydrogen etching of extreme ultraviolet induced carbon layers
Chen, J., Louis, E., Harmsen, R., Tsarfati, T., Wormeester, H., van Kampen, M., van Schaik, W., van de Kruijs, R. & Bijkerk, F., 2011, In: Applied surface science. 258, 1, p. 7-12 6 p.
Research output: Contribution to journal › Article › Academic › peer-review

Open Access
File
23 Citations (Scopus)

53 Downloads (Pure)