Cracking and delamination of metal organic vapour deposited alumina and silica films

V.A.C. Haanappel; H.D. van Corbach; T. Fransen; P.J. Gellings

doi:10.1016/0921-5093(93)90352-F

Cracking and delamination of metal organic vapour deposited alumina and silica films

V.A.C. Haanappel, H.D. van Corbach, T. Fransen, P.J. Gellings

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Abstract

Amorphous alumina and silica films were deposited on AISI by thermal decomposition at atmospheric pressure of aluminium-tri-sec-butoxide and di-acetoxy-di-tertiary-butoxided-silane respectively. Above a critical coating thickness of the oxide films, cracking and delamination occurred during the deposition process. These were due to intrinsic rather than to thermal stresses. Cracking and delamination do not occurs simultaneously. The fracture toughness of the film, the substrate and the interface is an important factor. After delamination along the substrate-film interface, the films curled to scrolls, indicating stress. A complete explanation of the stress gradient formed in the film during the deposition process is not yet available.

Original language	English
Pages (from-to)	179-185
Number of pages	7
Journal	Materials science & engineering
Volume	167
Issue number	1-2
DOIs	https://doi.org/10.1016/0921-5093(93)90352-F
Publication status	Published - 1993

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title = "Cracking and delamination of metal organic vapour deposited alumina and silica films",

abstract = "Amorphous alumina and silica films were deposited on AISI by thermal decomposition at atmospheric pressure of aluminium-tri-sec-butoxide and di-acetoxy-di-tertiary-butoxided-silane respectively. Above a critical coating thickness of the oxide films, cracking and delamination occurred during the deposition process. These were due to intrinsic rather than to thermal stresses. Cracking and delamination do not occurs simultaneously. The fracture toughness of the film, the substrate and the interface is an important factor. After delamination along the substrate-film interface, the films curled to scrolls, indicating stress. A complete explanation of the stress gradient formed in the film during the deposition process is not yet available.",

author = "V.A.C. Haanappel and {van Corbach}, H.D. and T. Fransen and P.J. Gellings",

year = "1993",

doi = "10.1016/0921-5093(93)90352-F",

language = "English",

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T1 - Cracking and delamination of metal organic vapour deposited alumina and silica films

AU - Haanappel, V.A.C.

AU - van Corbach, H.D.

AU - Fransen, T.

AU - Gellings, P.J.

PY - 1993

Y1 - 1993

N2 - Amorphous alumina and silica films were deposited on AISI by thermal decomposition at atmospheric pressure of aluminium-tri-sec-butoxide and di-acetoxy-di-tertiary-butoxided-silane respectively. Above a critical coating thickness of the oxide films, cracking and delamination occurred during the deposition process. These were due to intrinsic rather than to thermal stresses. Cracking and delamination do not occurs simultaneously. The fracture toughness of the film, the substrate and the interface is an important factor. After delamination along the substrate-film interface, the films curled to scrolls, indicating stress. A complete explanation of the stress gradient formed in the film during the deposition process is not yet available.

AB - Amorphous alumina and silica films were deposited on AISI by thermal decomposition at atmospheric pressure of aluminium-tri-sec-butoxide and di-acetoxy-di-tertiary-butoxided-silane respectively. Above a critical coating thickness of the oxide films, cracking and delamination occurred during the deposition process. These were due to intrinsic rather than to thermal stresses. Cracking and delamination do not occurs simultaneously. The fracture toughness of the film, the substrate and the interface is an important factor. After delamination along the substrate-film interface, the films curled to scrolls, indicating stress. A complete explanation of the stress gradient formed in the film during the deposition process is not yet available.

U2 - 10.1016/0921-5093(93)90352-F

DO - 10.1016/0921-5093(93)90352-F

M3 - Article

SN - 0025-5416

VL - 167

SP - 179

EP - 185

JO - Materials science & engineering

JF - Materials science & engineering

IS - 1-2

ER -

Cracking and delamination of metal organic vapour deposited alumina and silica films

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