Critical Review of 1-Particle Models in Electromigration Resistance Change Modeling

J. Niehof, H.C. de Graaff, A.J. Mouthaan, J.F. Verweij

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    2 Citations (Scopus)
    Original languageUndefined
    Title of host publicationSymposium Materials Research Society, Materials Reliability in Microelectronics IV
    Place of PublicationSan Fransisco, California, U.S.A.
    Pages465-470
    Publication statusPublished - 5 Apr 1994

    Keywords

    • METIS-113979

    Cite this

    Niehof, J., de Graaff, H. C., Mouthaan, A. J., & Verweij, J. F. (1994). Critical Review of 1-Particle Models in Electromigration Resistance Change Modeling. In Symposium Materials Research Society, Materials Reliability in Microelectronics IV (pp. 465-470). San Fransisco, California, U.S.A..