Critical Review of 1-Particle Models in Electromigration Resistance Change Modeling

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

Original language	Undefined
Title of host publication	Symposium Materials Research Society, Materials Reliability in Microelectronics IV
Place of Publication	San Fransisco, California, U.S.A.
Pages	465-470
Publication status	Published - 5 Apr 1994

Keywords

@inproceedings{017a4205cba541108ed8e83c6603f855,

title = "Critical Review of 1-Particle Models in Electromigration Resistance Change Modeling",

keywords = "METIS-113979",

author = "J. Niehof and \{de Graaff\}, H.C. and A.J. Mouthaan and J.F. Verweij",

year = "1994",

month = apr,

day = "5",

language = "Undefined",

pages = "465--470",

booktitle = "Symposium Materials Research Society, Materials Reliability in Microelectronics IV",

}

Critical Review of 1-Particle Models in Electromigration Resistance Change Modeling. / Niehof, J.; de Graaff, H.C.; Mouthaan, A.J. et al.
Symposium Materials Research Society, Materials Reliability in Microelectronics IV. San Fransisco, California, U.S.A., 1994. p. 465-470.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Critical Review of 1-Particle Models in Electromigration Resistance Change Modeling

AU - Niehof, J.

AU - de Graaff, H.C.

AU - Mouthaan, A.J.

AU - Verweij, J.F.

PY - 1994/4/5

Y1 - 1994/4/5

KW - METIS-113979

M3 - Conference contribution

SP - 465

EP - 470

BT - Symposium Materials Research Society, Materials Reliability in Microelectronics IV

CY - San Fransisco, California, U.S.A.

ER -