"CV doping profiling of boron out-diffusion using an abrupt and highly doped arsenic buried epilayer"

C. J. Ortiz*, L. K. Nanver, W. D. Van Noort, T. L.M. Scholtes, J. W. Slotboom

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

5 Citations (Scopus)

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Engineering & Materials Science