Damage accumulation in thin ruthenium films induced by repetitive exposure to femtosecond XUV pulses below the single-shot ablation threshold

Igor A. Makhotkin; Igor Milov; Jaromir Chalupský; Kai Tiedtke; Hartmut Enkisch; Gosse de Vries; Frank Scholze; Frank Siewert; Jacobus M. Sturm; Konstantin V. Nikolaev; Robbert W.E. van de Kruijs; Mark A. Smithers; Henk A.G.M. Van Wolferen; Enrico G. Keim; Eric Louis; Iwanna Jacyna; Marek Jurek; Dorota Klinger; Jerzy B. Pelka; Libor Juha; Věra Hájková; Vojtech Vozda; Tomáš Sburian; Karel Saksl; Bart Faatz; Barbara Keitel; Elke Plönjes; Siegfried Schreiber; Sven Toleikis; Rolf Loch; Martin Hermann; Sebastian Strobel; Rilpho Donker; Tobias Mey; Ryszard Sobierajski

doi:10.1364/JOSAB.35.002799

Damage accumulation in thin ruthenium films induced by repetitive exposure to femtosecond XUV pulses below the single-shot ablation threshold

Igor A. Makhotkin^* (Corresponding Author), Igor Milov, Jaromir Chalupský, Kai Tiedtke, Hartmut Enkisch, Gosse de Vries, Frank Scholze, Frank Siewert, Jacobus M. Sturm, Konstantin V. Nikolaev, Robbert W.E. van de Kruijs, Mark A. Smithers, Henk A.G.M. Van Wolferen, Enrico G. Keim, Eric Louis, Iwanna Jacyna, Marek Jurek, Dorota Klinger, Jerzy B. Pelka, Libor JuhaVěra Hájková, Vojtech Vozda, Tomáš Sburian, Karel Saksl, Bart Faatz, Barbara Keitel, Elke Plönjes, Siegfried Schreiber, Sven Toleikis, Rolf Loch, Martin Hermann, Sebastian Strobel, Rilpho Donker, Tobias Mey, Ryszard Sobierajski

^*Corresponding author for this work

XUV Optics

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Abstract

The process of damage accumulation in thin ruthenium films exposed to multiple femtosecond extreme ultraviolet (XUV) free-electron laser (FEL) pulses below the critical angle of reflectance at the FEL facility in Hamburg(FLASH) was experimentally analyzed. The multi-shot damage threshold is found to be lower than the single-shotdamage threshold. Detailed analysis of the damage morphology and its dependence on irradiation conditionsjustifies the assumption that cavitation induced by the FEL pulse is the prime mechanism responsible formulti-shot damage in optical coatings.

Original language	English
Pages (from-to)	2799-2805
Number of pages	7
Journal	Journal of the Optical Society of America B: Optical Physics
Volume	35
Issue number	11
DOIs	https://doi.org/10.1364/JOSAB.35.002799
Publication status	Published - 1 Nov 2018

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JOSA_DamageAccumulation_final_to_repositoryAccepted author version, 1.14 MBLicence: CC BY-NC
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Makhotkin, I. A., Milov, I., Chalupský, J., Tiedtke, K., Enkisch, H., de Vries, G., Scholze, F., Siewert, F., Sturm, J. M., Nikolaev, K. V., van de Kruijs, R. W. E., Smithers, M. A., Van Wolferen, H. A. G. M., Keim, E. G., Louis, E., Jacyna, I., Jurek, M., Klinger, D., Pelka, J. B., ... Sobierajski, R. (2018). Damage accumulation in thin ruthenium films induced by repetitive exposure to femtosecond XUV pulses below the single-shot ablation threshold. Journal of the Optical Society of America B: Optical Physics, 35(11), 2799-2805. https://doi.org/10.1364/JOSAB.35.002799

Makhotkin, Igor A. ; Milov, Igor ; Chalupský, Jaromir ; Tiedtke, Kai ; Enkisch, Hartmut ; de Vries, Gosse ; Scholze, Frank ; Siewert, Frank ; Sturm, Jacobus M. ; Nikolaev, Konstantin V. ; van de Kruijs, Robbert W.E. ; Smithers, Mark A. ; Van Wolferen, Henk A.G.M. ; Keim, Enrico G. ; Louis, Eric ; Jacyna, Iwanna ; Jurek, Marek ; Klinger, Dorota ; Pelka, Jerzy B. ; Juha, Libor ; Hájková, Věra ; Vozda, Vojtech ; Sburian, Tomáš ; Saksl, Karel ; Faatz, Bart ; Keitel, Barbara ; Plönjes, Elke ; Schreiber, Siegfried ; Toleikis, Sven ; Loch, Rolf ; Hermann, Martin ; Strobel, Sebastian ; Donker, Rilpho ; Mey, Tobias ; Sobierajski, Ryszard. / Damage accumulation in thin ruthenium films induced by repetitive exposure to femtosecond XUV pulses below the single-shot ablation threshold. In: Journal of the Optical Society of America B: Optical Physics. 2018 ; Vol. 35, No. 11. pp. 2799-2805.

@article{eed0f8e147574eada45f61cc77928423,

title = "Damage accumulation in thin ruthenium films induced by repetitive exposure to femtosecond XUV pulses below the single-shot ablation threshold",

abstract = "The process of damage accumulation in thin ruthenium films exposed to multiple femtosecond extreme ultraviolet (XUV) free-electron laser (FEL) pulses below the critical angle of reflectance at the FEL facility in Hamburg(FLASH) was experimentally analyzed. The multi-shot damage threshold is found to be lower than the single-shotdamage threshold. Detailed analysis of the damage morphology and its dependence on irradiation conditionsjustifies the assumption that cavitation induced by the FEL pulse is the prime mechanism responsible formulti-shot damage in optical coatings.",

author = "Makhotkin, {Igor A.} and Igor Milov and Jaromir Chalupsk{\'y} and Kai Tiedtke and Hartmut Enkisch and {de Vries}, Gosse and Frank Scholze and Frank Siewert and Sturm, {Jacobus M.} and Nikolaev, {Konstantin V.} and {van de Kruijs}, {Robbert W.E.} and Smithers, {Mark A.} and {Van Wolferen}, {Henk A.G.M.} and Keim, {Enrico G.} and Eric Louis and Iwanna Jacyna and Marek Jurek and Dorota Klinger and Pelka, {Jerzy B.} and Libor Juha and V{\v e}ra H{\'a}jkov{\'a} and Vojtech Vozda and Tom{\'a}{\v s} Sburian and Karel Saksl and Bart Faatz and Barbara Keitel and Elke Pl{\"o}njes and Siegfried Schreiber and Sven Toleikis and Rolf Loch and Martin Hermann and Sebastian Strobel and Rilpho Donker and Tobias Mey and Ryszard Sobierajski",

year = "2018",

month = nov,

day = "1",

doi = "10.1364/JOSAB.35.002799",

language = "English",

volume = "35",

pages = "2799--2805",

journal = "Journal of the Optical Society of America. B: Optical physics",

issn = "0740-3224",

publisher = "The Optical Society",

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Makhotkin, IA, Milov, I, Chalupský, J, Tiedtke, K, Enkisch, H, de Vries, G, Scholze, F, Siewert, F, Sturm, JM, Nikolaev, KV, van de Kruijs, RWE , Smithers, MA , Van Wolferen, HAGM , Keim, EG , Louis, E, Jacyna, I, Jurek, M, Klinger, D, Pelka, JB, Juha, L, Hájková, V, Vozda, V, Sburian, T, Saksl, K, Faatz, B, Keitel, B, Plönjes, E, Schreiber, S, Toleikis, S, Loch, R, Hermann, M, Strobel, S, Donker, R, Mey, T & Sobierajski, R 2018, 'Damage accumulation in thin ruthenium films induced by repetitive exposure to femtosecond XUV pulses below the single-shot ablation threshold', Journal of the Optical Society of America B: Optical Physics, vol. 35, no. 11, pp. 2799-2805. https://doi.org/10.1364/JOSAB.35.002799

Damage accumulation in thin ruthenium films induced by repetitive exposure to femtosecond XUV pulses below the single-shot ablation threshold. / Makhotkin, Igor A. (Corresponding Author); Milov, Igor; Chalupský, Jaromir; Tiedtke, Kai; Enkisch, Hartmut; de Vries, Gosse; Scholze, Frank; Siewert, Frank; Sturm, Jacobus M.; Nikolaev, Konstantin V.; van de Kruijs, Robbert W.E.; Smithers, Mark A.; Van Wolferen, Henk A.G.M.; Keim, Enrico G.; Louis, Eric; Jacyna, Iwanna; Jurek, Marek; Klinger, Dorota; Pelka, Jerzy B.; Juha, Libor; Hájková, Věra; Vozda, Vojtech; Sburian, Tomáš; Saksl, Karel; Faatz, Bart; Keitel, Barbara; Plönjes, Elke; Schreiber, Siegfried; Toleikis, Sven; Loch, Rolf; Hermann, Martin; Strobel, Sebastian; Donker, Rilpho; Mey, Tobias; Sobierajski, Ryszard.

In: Journal of the Optical Society of America B: Optical Physics, Vol. 35, No. 11, 01.11.2018, p. 2799-2805.

Research output: Contribution to journal › Article › Academic › peer-review

TY - JOUR

T1 - Damage accumulation in thin ruthenium films induced by repetitive exposure to femtosecond XUV pulses below the single-shot ablation threshold

AU - Makhotkin, Igor A.

AU - Milov, Igor

AU - Chalupský, Jaromir

AU - Tiedtke, Kai

AU - Enkisch, Hartmut

AU - de Vries, Gosse

AU - Scholze, Frank

AU - Siewert, Frank

AU - Sturm, Jacobus M.

AU - Nikolaev, Konstantin V.

AU - van de Kruijs, Robbert W.E.

AU - Smithers, Mark A.

AU - Van Wolferen, Henk A.G.M.

AU - Keim, Enrico G.

AU - Louis, Eric

AU - Jacyna, Iwanna

AU - Jurek, Marek

AU - Klinger, Dorota

AU - Pelka, Jerzy B.

AU - Juha, Libor

AU - Hájková, Věra

AU - Vozda, Vojtech

AU - Sburian, Tomáš

AU - Saksl, Karel

AU - Faatz, Bart

AU - Keitel, Barbara

AU - Plönjes, Elke

AU - Schreiber, Siegfried

AU - Toleikis, Sven

AU - Loch, Rolf

AU - Hermann, Martin

AU - Strobel, Sebastian

AU - Donker, Rilpho

AU - Mey, Tobias

AU - Sobierajski, Ryszard

PY - 2018/11/1

Y1 - 2018/11/1

N2 - The process of damage accumulation in thin ruthenium films exposed to multiple femtosecond extreme ultraviolet (XUV) free-electron laser (FEL) pulses below the critical angle of reflectance at the FEL facility in Hamburg(FLASH) was experimentally analyzed. The multi-shot damage threshold is found to be lower than the single-shotdamage threshold. Detailed analysis of the damage morphology and its dependence on irradiation conditionsjustifies the assumption that cavitation induced by the FEL pulse is the prime mechanism responsible formulti-shot damage in optical coatings.

AB - The process of damage accumulation in thin ruthenium films exposed to multiple femtosecond extreme ultraviolet (XUV) free-electron laser (FEL) pulses below the critical angle of reflectance at the FEL facility in Hamburg(FLASH) was experimentally analyzed. The multi-shot damage threshold is found to be lower than the single-shotdamage threshold. Detailed analysis of the damage morphology and its dependence on irradiation conditionsjustifies the assumption that cavitation induced by the FEL pulse is the prime mechanism responsible formulti-shot damage in optical coatings.

UR - http://www.scopus.com/inward/record.url?scp=85056121487&partnerID=8YFLogxK

U2 - 10.1364/JOSAB.35.002799

DO - 10.1364/JOSAB.35.002799

M3 - Article

AN - SCOPUS:85056121487

VL - 35

SP - 2799

EP - 2805

JO - Journal of the Optical Society of America. B: Optical physics

JF - Journal of the Optical Society of America. B: Optical physics

SN - 0740-3224

IS - 11

ER -

Damage accumulation in thin ruthenium films induced by repetitive exposure to femtosecond XUV pulses below the single-shot ablation threshold

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