@article{eed0f8e147574eada45f61cc77928423,
title = "Damage accumulation in thin ruthenium films induced by repetitive exposure to femtosecond XUV pulses below the single-shot ablation threshold",
abstract = "The process of damage accumulation in thin ruthenium films exposed to multiple femtosecond extreme ultraviolet (XUV) free-electron laser (FEL) pulses below the critical angle of reflectance at the FEL facility in Hamburg(FLASH) was experimentally analyzed. The multi-shot damage threshold is found to be lower than the single-shotdamage threshold. Detailed analysis of the damage morphology and its dependence on irradiation conditionsjustifies the assumption that cavitation induced by the FEL pulse is the prime mechanism responsible formulti-shot damage in optical coatings.",
keywords = "2019 OA procedure",
author = "Makhotkin, {Igor A.} and Igor Milov and Jaromir Chalupsk{\'y} and Kai Tiedtke and Hartmut Enkisch and {de Vries}, Gosse and Frank Scholze and Frank Siewert and Sturm, {Jacobus M.} and Nikolaev, {Konstantin V.} and {van de Kruijs}, {Robbert W.E.} and Smithers, {Mark A.} and {Van Wolferen}, {Henk A.G.M.} and Keim, {Enrico G.} and Eric Louis and Iwanna Jacyna and Marek Jurek and Dorota Klinger and Pelka, {Jerzy B.} and Libor Juha and V{\v e}ra H{\'a}jkov{\'a} and Vojtech Vozda and Tom{\'a}{\v s} Sburian and Karel Saksl and Bart Faatz and Barbara Keitel and Elke Pl{\"o}njes and Siegfried Schreiber and Sven Toleikis and Rolf Loch and Martin Hermann and Sebastian Strobel and Rilpho Donker and Tobias Mey and Ryszard Sobierajski",
year = "2018",
month = nov,
day = "1",
doi = "10.1364/JOSAB.35.002799",
language = "English",
volume = "35",
pages = "2799--2805",
journal = "Journal of the Optical Society of America. B: Optical physics",
issn = "0740-3224",
publisher = "Optica Publishing Group (formerly OSA)",
number = "11",
}