Damage in Mo/Si multilayer optics irradiated by intense short-wavelength FELs

Eric Louis; R. Sobierajski; R.A. Loch; C. Bostedt; J. Bozek; T. Burian; J. Chalupsky; J. Gaudin; A. Graf; J. Grzonka; V. Hajkova; S.P. Hau-Riege; E.D. van Hattum; L. Juha; D. Klinger; J. Krzywinski; R. London; M. Messerschmidt; S. Moeller; T. Plocinski; A. Wawro; P. Zabierowski; Frederik Bijkerk

Damage in Mo/Si multilayer optics irradiated by intense short-wavelength FELs

Eric Louis, R. Sobierajski, R.A. Loch, C. Bostedt, J. Bozek, T. Burian, J. Chalupsky, J. Gaudin, A. Graf, J. Grzonka, V. Hajkova, S.P. Hau-Riege, E.D. van Hattum, L. Juha, D. Klinger, J. Krzywinski, R. London, M. Messerschmidt, S. Moeller, T. PlocinskiA. Wawro, P. Zabierowski, Frederik Bijkerk

Laser Physics & Nonlinear Optics

Research output: Other contribution › Other research output

Abstract

Multilayer coated optics are promising candidates for optical schemes at XUV & X-ray Free Electron Lasers. They can fulfill the extreme requirements in terms of figure and roughness errors, wavefront preservation, and stability. Such optics enable deflection angles much larger than those reasonably achieved with single material mirrors. In addition, due to their good wavelength selectivity, they can be used as narrow bandpass filters. However, since damage of the optical surface is a possible limitation, resistivity studies of MoSi multilayers were carried out at the XUV Free Electron Laser FLASH in Hamburg. The results, reported in [1], show that the leading damage mechanism is melting of the amorphous silicon layer, followed by Mo atoms diffusion into Si, leading to molybdenum-silicide formation. These studies have been extended to the soft X-ray part of the spectrum at the LCLS FEL facility. Although a similar final state of damage was observed, the damage threshold appeared to be strongly wavelength dependent. A possible explanation will be discussed during the presentation. The results are important for the design and further development of the optical coatings for the new generation of the short wavelength light sources, not only for the multilayers but for the single metallic layer coatings as well.

Original language	English
Place of Publication	Prague
Publication status	Published - 2011

Keywords

METIS-304955

Fingerprint Dive into the research topics of 'Damage in Mo/Si multilayer optics irradiated by intense short-wavelength FELs'. Together they form a unique fingerprint.

Cite this

Louis, E., Sobierajski, R., Loch, R. A., Bostedt, C., Bozek, J., Burian, T., ... Bijkerk, F. (2011). Damage in Mo/Si multilayer optics irradiated by intense short-wavelength FELs. Prague.

Louis, Eric ; Sobierajski, R. ; Loch, R.A. ; Bostedt, C. ; Bozek, J. ; Burian, T. ; Chalupsky, J. ; Gaudin, J. ; Graf, A. ; Grzonka, J. ; Hajkova, V. ; Hau-Riege, S.P. ; van Hattum, E.D. ; Juha, L. ; Klinger, D. ; Krzywinski, J. ; London, R. ; Messerschmidt, M. ; Moeller, S. ; Plocinski, T. ; Wawro, A. ; Zabierowski, P. ; Bijkerk, Frederik. / Damage in Mo/Si multilayer optics irradiated by intense short-wavelength FELs. 2011. Prague.

@misc{eccf68ce742b4f3fb54a34ffd460154f,

title = "Damage in Mo/Si multilayer optics irradiated by intense short-wavelength FELs",

abstract = "Multilayer coated optics are promising candidates for optical schemes at XUV & X-ray Free Electron Lasers. They can fulfill the extreme requirements in terms of figure and roughness errors, wavefront preservation, and stability. Such optics enable deflection angles much larger than those reasonably achieved with single material mirrors. In addition, due to their good wavelength selectivity, they can be used as narrow bandpass filters. However, since damage of the optical surface is a possible limitation, resistivity studies of MoSi multilayers were carried out at the XUV Free Electron Laser FLASH in Hamburg. The results, reported in [1], show that the leading damage mechanism is melting of the amorphous silicon layer, followed by Mo atoms diffusion into Si, leading to molybdenum-silicide formation. These studies have been extended to the soft X-ray part of the spectrum at the LCLS FEL facility. Although a similar final state of damage was observed, the damage threshold appeared to be strongly wavelength dependent. A possible explanation will be discussed during the presentation. The results are important for the design and further development of the optical coatings for the new generation of the short wavelength light sources, not only for the multilayers but for the single metallic layer coatings as well.",

keywords = "METIS-304955",

author = "Eric Louis and R. Sobierajski and R.A. Loch and C. Bostedt and J. Bozek and T. Burian and J. Chalupsky and J. Gaudin and A. Graf and J. Grzonka and V. Hajkova and S.P. Hau-Riege and {van Hattum}, E.D. and L. Juha and D. Klinger and J. Krzywinski and R. London and M. Messerschmidt and S. Moeller and T. Plocinski and A. Wawro and P. Zabierowski and Frederik Bijkerk",

year = "2011",

language = "English",

type = "Other",

}

Louis, E, Sobierajski, R, Loch, RA, Bostedt, C, Bozek, J, Burian, T, Chalupsky, J, Gaudin, J, Graf, A, Grzonka, J, Hajkova, V, Hau-Riege, SP, van Hattum, ED, Juha, L, Klinger, D, Krzywinski, J, London, R, Messerschmidt, M, Moeller, S, Plocinski, T, Wawro, A, Zabierowski, P & Bijkerk, F 2011, Damage in Mo/Si multilayer optics irradiated by intense short-wavelength FELs. Prague.

Damage in Mo/Si multilayer optics irradiated by intense short-wavelength FELs. / Louis, Eric; Sobierajski, R.; Loch, R.A.; Bostedt, C.; Bozek, J.; Burian, T.; Chalupsky, J.; Gaudin, J.; Graf, A.; Grzonka, J.; Hajkova, V.; Hau-Riege, S.P.; van Hattum, E.D.; Juha, L.; Klinger, D.; Krzywinski, J.; London, R.; Messerschmidt, M.; Moeller, S.; Plocinski, T.; Wawro, A.; Zabierowski, P.; Bijkerk, Frederik.

Prague. 2011, .

Research output: Other contribution › Other research output

TY - GEN

T1 - Damage in Mo/Si multilayer optics irradiated by intense short-wavelength FELs

AU - Louis, Eric

AU - Sobierajski, R.

AU - Loch, R.A.

AU - Bostedt, C.

AU - Bozek, J.

AU - Burian, T.

AU - Chalupsky, J.

AU - Gaudin, J.

AU - Graf, A.

AU - Grzonka, J.

AU - Hajkova, V.

AU - Hau-Riege, S.P.

AU - van Hattum, E.D.

AU - Juha, L.

AU - Klinger, D.

AU - Krzywinski, J.

AU - London, R.

AU - Messerschmidt, M.

AU - Moeller, S.

AU - Plocinski, T.

AU - Wawro, A.

AU - Zabierowski, P.

AU - Bijkerk, Frederik

PY - 2011

Y1 - 2011

N2 - Multilayer coated optics are promising candidates for optical schemes at XUV & X-ray Free Electron Lasers. They can fulfill the extreme requirements in terms of figure and roughness errors, wavefront preservation, and stability. Such optics enable deflection angles much larger than those reasonably achieved with single material mirrors. In addition, due to their good wavelength selectivity, they can be used as narrow bandpass filters. However, since damage of the optical surface is a possible limitation, resistivity studies of MoSi multilayers were carried out at the XUV Free Electron Laser FLASH in Hamburg. The results, reported in [1], show that the leading damage mechanism is melting of the amorphous silicon layer, followed by Mo atoms diffusion into Si, leading to molybdenum-silicide formation. These studies have been extended to the soft X-ray part of the spectrum at the LCLS FEL facility. Although a similar final state of damage was observed, the damage threshold appeared to be strongly wavelength dependent. A possible explanation will be discussed during the presentation. The results are important for the design and further development of the optical coatings for the new generation of the short wavelength light sources, not only for the multilayers but for the single metallic layer coatings as well.

AB - Multilayer coated optics are promising candidates for optical schemes at XUV & X-ray Free Electron Lasers. They can fulfill the extreme requirements in terms of figure and roughness errors, wavefront preservation, and stability. Such optics enable deflection angles much larger than those reasonably achieved with single material mirrors. In addition, due to their good wavelength selectivity, they can be used as narrow bandpass filters. However, since damage of the optical surface is a possible limitation, resistivity studies of MoSi multilayers were carried out at the XUV Free Electron Laser FLASH in Hamburg. The results, reported in [1], show that the leading damage mechanism is melting of the amorphous silicon layer, followed by Mo atoms diffusion into Si, leading to molybdenum-silicide formation. These studies have been extended to the soft X-ray part of the spectrum at the LCLS FEL facility. Although a similar final state of damage was observed, the damage threshold appeared to be strongly wavelength dependent. A possible explanation will be discussed during the presentation. The results are important for the design and further development of the optical coatings for the new generation of the short wavelength light sources, not only for the multilayers but for the single metallic layer coatings as well.

KW - METIS-304955

M3 - Other contribution

CY - Prague

ER -