Damage studies of multilayer optics for XUV free electron lasers

Eric Louis, A.R. Khorsand, R. Sobierajski, E. van Hattum, M. Jurek, D. Klinger, J.B. Pelka, L. Juha, J. Chalupsky, J. Cihelka, V. Hajkova, U. Jastrow, S. Toleikis, H. Wabnitz, K. Tiedtke, J. Gaudin, E.M. Gullikson, Frederik Bijkerk

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

18 Citations (Scopus)

Abstract

We exposed standard Mo/Si multilayer coatings, optimized for 13.5 nm radiation to the intense femtosecond XUV radiation at the FLASH free electron laser facility at intensities below and above the multilayer ablation threshold. The interaction process was studied in-situ with reflectometry and time resolved optical microscopy, and ex-situ with optical microscopy (Nomarski), atomic force microscopy and high resolution transmission electron microscopy. From analysis of the size of the observed craters as a function of the pulse energy the threshold for irreversible damage of the multilayer could be determined to be 45 mJ/cm2. The damage occurs on a longer time scale than the XUV pulse and even above the damage threshold XUV reflectance has been observed showing no measurable loss up to a power density of 1013 W/cm2. A first explanation of the physics mechanism leading to damage is given.
Original languageEnglish
Title of host publicationDamage to VUV, EUV, and X-Ray Optics II
Subtitle of host publication21–23 April 2009, Prague, Czech Republic
EditorsLibor Juha, Saša Bajt, Ryszard Sobierajski
PublisherSPIE
Number of pages6
ISBN (Print)9780819476357
DOIs
Publication statusPublished - 2009
EventSPIE Optics + Optoelectronics 2009 - Prague, Czech Republic
Duration: 21 Apr 200923 Apr 2009

Publication series

NameProceedings of SPIE
PublisherSPIE
Volume7361
ISSN (Print)0277-786X

Conference

ConferenceSPIE Optics + Optoelectronics 2009
CountryCzech Republic
CityPrague
Period21/04/0923/04/09

Fingerprint

free electron lasers
optics
damage
microscopy
thresholds
radiation
yield point
pulses
craters
ablation
radiant flux density
atomic force microscopy
reflectance
coatings
transmission electron microscopy
physics
high resolution
interactions
energy

Keywords

  • METIS-266557

Cite this

Louis, E., Khorsand, A. R., Sobierajski, R., van Hattum, E., Jurek, M., Klinger, D., ... Bijkerk, F. (2009). Damage studies of multilayer optics for XUV free electron lasers. In L. Juha, S. Bajt, & R. Sobierajski (Eds.), Damage to VUV, EUV, and X-Ray Optics II: 21–23 April 2009, Prague, Czech Republic [73610I] (Proceedings of SPIE; Vol. 7361). SPIE. https://doi.org/10.1117/12.822257
Louis, Eric ; Khorsand, A.R. ; Sobierajski, R. ; van Hattum, E. ; Jurek, M. ; Klinger, D. ; Pelka, J.B. ; Juha, L. ; Chalupsky, J. ; Cihelka, J. ; Hajkova, V. ; Jastrow, U. ; Toleikis, S. ; Wabnitz, H. ; Tiedtke, K. ; Gaudin, J. ; Gullikson, E.M. ; Bijkerk, Frederik. / Damage studies of multilayer optics for XUV free electron lasers. Damage to VUV, EUV, and X-Ray Optics II: 21–23 April 2009, Prague, Czech Republic. editor / Libor Juha ; Saša Bajt ; Ryszard Sobierajski. SPIE, 2009. (Proceedings of SPIE).
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title = "Damage studies of multilayer optics for XUV free electron lasers",
abstract = "We exposed standard Mo/Si multilayer coatings, optimized for 13.5 nm radiation to the intense femtosecond XUV radiation at the FLASH free electron laser facility at intensities below and above the multilayer ablation threshold. The interaction process was studied in-situ with reflectometry and time resolved optical microscopy, and ex-situ with optical microscopy (Nomarski), atomic force microscopy and high resolution transmission electron microscopy. From analysis of the size of the observed craters as a function of the pulse energy the threshold for irreversible damage of the multilayer could be determined to be 45 mJ/cm2. The damage occurs on a longer time scale than the XUV pulse and even above the damage threshold XUV reflectance has been observed showing no measurable loss up to a power density of 1013 W/cm2. A first explanation of the physics mechanism leading to damage is given.",
keywords = "METIS-266557",
author = "Eric Louis and A.R. Khorsand and R. Sobierajski and {van Hattum}, E. and M. Jurek and D. Klinger and J.B. Pelka and L. Juha and J. Chalupsky and J. Cihelka and V. Hajkova and U. Jastrow and S. Toleikis and H. Wabnitz and K. Tiedtke and J. Gaudin and E.M. Gullikson and Frederik Bijkerk",
year = "2009",
doi = "10.1117/12.822257",
language = "English",
isbn = "9780819476357",
series = "Proceedings of SPIE",
publisher = "SPIE",
editor = "Libor Juha and Saša Bajt and Ryszard Sobierajski",
booktitle = "Damage to VUV, EUV, and X-Ray Optics II",
address = "United States",

}

Louis, E, Khorsand, AR, Sobierajski, R, van Hattum, E, Jurek, M, Klinger, D, Pelka, JB, Juha, L, Chalupsky, J, Cihelka, J, Hajkova, V, Jastrow, U, Toleikis, S, Wabnitz, H, Tiedtke, K, Gaudin, J, Gullikson, EM & Bijkerk, F 2009, Damage studies of multilayer optics for XUV free electron lasers. in L Juha, S Bajt & R Sobierajski (eds), Damage to VUV, EUV, and X-Ray Optics II: 21–23 April 2009, Prague, Czech Republic., 73610I, Proceedings of SPIE, vol. 7361, SPIE, SPIE Optics + Optoelectronics 2009, Prague, Czech Republic, 21/04/09. https://doi.org/10.1117/12.822257

Damage studies of multilayer optics for XUV free electron lasers. / Louis, Eric; Khorsand, A.R.; Sobierajski, R.; van Hattum, E.; Jurek, M.; Klinger, D.; Pelka, J.B.; Juha, L.; Chalupsky, J.; Cihelka, J.; Hajkova, V.; Jastrow, U.; Toleikis, S.; Wabnitz, H.; Tiedtke, K.; Gaudin, J.; Gullikson, E.M.; Bijkerk, Frederik.

Damage to VUV, EUV, and X-Ray Optics II: 21–23 April 2009, Prague, Czech Republic. ed. / Libor Juha; Saša Bajt; Ryszard Sobierajski. SPIE, 2009. 73610I (Proceedings of SPIE; Vol. 7361).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

TY - GEN

T1 - Damage studies of multilayer optics for XUV free electron lasers

AU - Louis, Eric

AU - Khorsand, A.R.

AU - Sobierajski, R.

AU - van Hattum, E.

AU - Jurek, M.

AU - Klinger, D.

AU - Pelka, J.B.

AU - Juha, L.

AU - Chalupsky, J.

AU - Cihelka, J.

AU - Hajkova, V.

AU - Jastrow, U.

AU - Toleikis, S.

AU - Wabnitz, H.

AU - Tiedtke, K.

AU - Gaudin, J.

AU - Gullikson, E.M.

AU - Bijkerk, Frederik

PY - 2009

Y1 - 2009

N2 - We exposed standard Mo/Si multilayer coatings, optimized for 13.5 nm radiation to the intense femtosecond XUV radiation at the FLASH free electron laser facility at intensities below and above the multilayer ablation threshold. The interaction process was studied in-situ with reflectometry and time resolved optical microscopy, and ex-situ with optical microscopy (Nomarski), atomic force microscopy and high resolution transmission electron microscopy. From analysis of the size of the observed craters as a function of the pulse energy the threshold for irreversible damage of the multilayer could be determined to be 45 mJ/cm2. The damage occurs on a longer time scale than the XUV pulse and even above the damage threshold XUV reflectance has been observed showing no measurable loss up to a power density of 1013 W/cm2. A first explanation of the physics mechanism leading to damage is given.

AB - We exposed standard Mo/Si multilayer coatings, optimized for 13.5 nm radiation to the intense femtosecond XUV radiation at the FLASH free electron laser facility at intensities below and above the multilayer ablation threshold. The interaction process was studied in-situ with reflectometry and time resolved optical microscopy, and ex-situ with optical microscopy (Nomarski), atomic force microscopy and high resolution transmission electron microscopy. From analysis of the size of the observed craters as a function of the pulse energy the threshold for irreversible damage of the multilayer could be determined to be 45 mJ/cm2. The damage occurs on a longer time scale than the XUV pulse and even above the damage threshold XUV reflectance has been observed showing no measurable loss up to a power density of 1013 W/cm2. A first explanation of the physics mechanism leading to damage is given.

KW - METIS-266557

U2 - 10.1117/12.822257

DO - 10.1117/12.822257

M3 - Conference contribution

SN - 9780819476357

T3 - Proceedings of SPIE

BT - Damage to VUV, EUV, and X-Ray Optics II

A2 - Juha, Libor

A2 - Bajt, Saša

A2 - Sobierajski, Ryszard

PB - SPIE

ER -

Louis E, Khorsand AR, Sobierajski R, van Hattum E, Jurek M, Klinger D et al. Damage studies of multilayer optics for XUV free electron lasers. In Juha L, Bajt S, Sobierajski R, editors, Damage to VUV, EUV, and X-Ray Optics II: 21–23 April 2009, Prague, Czech Republic. SPIE. 2009. 73610I. (Proceedings of SPIE). https://doi.org/10.1117/12.822257