Damage studies of multilayer optics for XUV free electron lasers

Eric Louis, A.R. Khorsand, R. Sobierajski, E.D. van Hattum, M. Jurek, D. Klinger, J.B. Pelka, L. Juha, J. Chalupsky, J. Cihelka, V. Hajkova, U. Jastrow, S. Toleikis, H. Wabnitz, K. Tiedtke, J. Gaudin, E.M. Gullikson, Frederik Bijkerk

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

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We exposed standard Mo/Si multilayer coatings, optimized for 13.5 nm radiation to the intense femtosecond XUV radiation at the FLASH free electron laser facility at intensities below and above the multilayer ablation threshold. The interaction process was studied in-situ with reflectometry and time resolved optical microscopy, and ex-situ with optical microscopy (Nomarski), atomic force microscopy and high resolution transmission electron microscopy. From analysis of the size of the observed craters as a function of the pulse energy the threshold for irreversible damage of the multilayer could be determined to be 45 mJ/cm2. The damage occurs on a longer time scale than the XUV pulse and even above the damage threshold XUV reflectance has been observed showing no measurable loss up to a power density of 1013 W/cm2. A first explanation of the physics mechanism leading to damage is given.
Original languageEnglish
Title of host publicationDamage to VUV, EUV, and X-Ray Optics II
Subtitle of host publication21–23 April 2009, Prague, Czech Republic
EditorsLibor Juha, Saša Bajt, Ryszard Sobierajski
Number of pages6
ISBN (Print)9780819476357
Publication statusPublished - 2009
EventSPIE Optics + Optoelectronics 2009 - Prague, Czech Republic
Duration: 21 Apr 200923 Apr 2009

Publication series

NameProceedings of SPIE
ISSN (Print)0277-786X


ConferenceSPIE Optics + Optoelectronics 2009
Country/TerritoryCzech Republic


  • METIS-266557


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